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  • Other Dry Etching Recipes
    ...tps://wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe] ...ch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO<sub>2</sub> Etch Recipe 1]
    1 KB (178 words) - 08:17, 9 December 2022
  • ADT 7100 - Recovering an Old Recipe (2019)
    # Go to any recipe # Click 'Recipe Import'[[File:Recipe import.png]]
    487 bytes (77 words) - 03:15, 27 March 2019
  • PECVD1 Recipes
    *[[ media: NewPECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] *[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Recipe]]
    2 KB (250 words) - 16:22, 8 January 2015
  • PECV1 Wafer Coating Process Traveler
    [[Table SiO2 recipe]]
    21 bytes (3 words) - 16:00, 30 March 2020
  • PECVD1-SiN standard recipe.pdf
    ...//drive.google.com/?tab=mo&authuser=0#my-drive=sharing PECVD1-SIN Standard Recipe]
    90 bytes (13 words) - 15:21, 18 March 2014
  • PECVD1 Wafer Coating Process Traveler
    * Seasoning recipe name: * Deposition recipe name:
    2 KB (325 words) - 16:38, 30 March 2020
  • PECVD1-SIN Standard Recipe (PlasmaTherm 790)
    ...uBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing PECVD1-SiN Standard Recipe Spreadsheet]
    174 bytes (20 words) - 15:37, 18 March 2014
  • PECVD1 Wafer Coating Process
    #* Load the seasoning recipe (SiN seasoning), and run it. The goal of this step is to coat chamber walls #* Load the deposition recipe (SiN@250C), and run it. Deposition time is variable. Get the rate from [htt
    2 KB (270 words) - 13:16, 10 December 2020
  • OLD - PECVD2 Recipes
    *[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]] *[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
    1 KB (189 words) - 12:28, 3 March 2022
  • Wafer Coating Process Traveler
    #*Load the seasoning recipe (STD SiO2), and run it. The goal of this step is to coat oxide on chamber w #*Load the deposition recipe (STD SiO2), and run it. Deposition time is variable. Get the rate from [htt
    3 KB (416 words) - 16:54, 22 April 2020
  • RIE Etching Recipes
    *[//wiki.nanotech.ucsb.edu/w/images/b/b4/ZnS_Plasma_Etch-1.pdf ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar] ....edu/w/images/2/2f/SiO2-Etch-Recipe-using-RIE-3-a.pdf SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]
    2 KB (253 words) - 10:02, 14 June 2021
  • Wafer Coating Process Traveler1
    * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min''' * Deposition recipe name: '''SiO2 LDR 250°C, t=780 sec'''
    4 KB (711 words) - 13:32, 30 March 2020
  • RIE5 - Standard Operating procedure (Cortex Software)
    # Choose a recipe to run from the '''Recipe''' menu list. # Choose a recipe to run from the list of available recipes.
    2 KB (377 words) - 14:09, 17 October 2018
  • PECVD Recipes
    ...E_917R6jF_K-btCHjsiIM/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
    14 KB (2,130 words) - 10:28, 20 December 2023
  • Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond
    * Set up POLOS recipe * Run recipe:
    823 bytes (131 words) - 08:12, 11 August 2020
  • CDE ResMap Quick-Start instructions
    ...as location - 800px annot quarterwf.png|none|thumb|200x200px|Quarter Wafer recipe measurement location]] # Select Operator > Run Recipe
    1 KB (214 words) - 13:01, 17 April 2018
  • Unaxis wafer coating procedure
    ...of Dec. 2019), users may '''only edit <u>Deposition Time</u>''', no other recipe modifications or customizations are permitted without staff approval. * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''
    5 KB (801 words) - 21:29, 12 August 2020
  • Atomic Layer Deposition Recipes
    ...ction. This Ozone-generator must be manually turned on before running the recipe - check with [[Atomic Layer Deposition (Oxford FlexAL)|supervisor]] for det For some recipes such as TiN, there are two loops in the recipe. The outermost loop controls the total thickness of the film, the inner lo
    7 KB (1,104 words) - 10:27, 15 June 2023
  • Wafer Scanning process Traveler
    ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai
    2 KB (339 words) - 11:31, 22 April 2020
  • Wafer Scanning/Coating Process Traveler ( combined/less detailed)
    * Example of how to run process for the standard recipe "SiO2 LDR 250°C" ** Load seasoning recipe " SiO2 seasoning" , time=2min
    3 KB (515 words) - 13:41, 20 April 2020
  • Old Deposition Data - NastaziaM 2021-11-22
    * SiO<sub>2</sub> [PECVD 1] Standard Recipe * Si<sub>3</sub>N<sub>4</sub> [PECVD 1] Standard Recipe
    36 KB (5,386 words) - 09:31, 14 December 2021
  • S-Cubed Flexi - Operating Procedure
    ...k if hot plates are set to the needs temperatures. If not, run Temp-change recipe: #run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.
    2 KB (396 words) - 14:39, 8 November 2022
  • Oxygen Plasma System Recipes
    Recipe Temperature control is by the lift-pins , with hotplate at 200°C ====Recipe Names:====
    6 KB (887 words) - 13:55, 1 March 2024
  • Automated Coat/Develop System (S-Cubed Flexi)
    |recipe = Lithography ...cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamina
    2 KB (340 words) - 14:41, 8 November 2022
  • Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers
    ...transfers of wafers in/out of the chamber, and manual ending of a running recipe, so specific detailed instructions are not necessary.
    422 bytes (69 words) - 11:11, 8 June 2020
  • Deposition Data - temporary 2021-12-15
    ...t0ovP0MtpFtICjpH0-prs/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
    17 KB (2,624 words) - 00:07, 16 December 2021
  • Wafer Bonder (SUSS SB6-8E)
    ...em is computer controlled with a windows environment allowing for multiple recipe steps and saving of recipes and data. The system is configured for manual l ...i.nanofab.ucsb.edu/w/images/5/5c/Suss_Bonder_Recipe_Guidelines.docx Bonder Recipe Guidelines]
    2 KB (229 words) - 10:53, 20 September 2023
  • Dicing Saw (ADT)
    *[[ADT 7100 - Recovering an Old Recipe (2019)|Recovering an Old Recipe]]
    2 KB (273 words) - 15:11, 17 October 2023
  • Filmetrics F10-RT-UVX Operating Procedure
    ...or Reflectance measurement by clicking '''Spectra''' button, then, '''Edit Recipe''' button, then, '''Acquisition Settings''' tab. # Click '''Edit Recipe''' button, then, edit the model according to your film sample (suck as film
    4 KB (664 words) - 12:52, 4 September 2021
  • Old Deposition Data - 2021-12-15
    ...ts/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si3N4 Standard Recipe] ...ets/d/1uqpg3sirsRbXdTFlxZ6_k3t0ovP0MtpFtICjpH0-prs/edit#gid= SiO2 Standard Recipe]
    31 KB (4,516 words) - 00:18, 16 December 2021
  • KLA Tencor P7 - Basic profile instructions
    #From the main Profiler screen, select scan recipe. #Single click a scan recipe based on the total height of the structure to be measured.
    2 KB (336 words) - 15:20, 2 November 2022
  • Oxford ICP Etcher (PlasmaPro 100 Cobra)
    **GaAs-baased epitaxies - ''starter recipe is available'' **GaN-based epitaxies - ''starter recipe is available''
    4 KB (532 words) - 23:33, 4 May 2023
  • Intellemetrics Laser Etch Monitor Procedure for Panasonic ICP Etchers
    === Laser Monitor & Recipe setup === ...Time is longer than expected, to stop using the Manual Box instead of the recipe time.
    6 KB (876 words) - 14:23, 13 June 2019
  • Atomic Layer Deposition (Oxford FlexAL)
    **Includes recipe names for various films, and approx. dep. rates ...regime is rather complex. [[Bill Mitchell]] is the resident expert on ALD recipe development.
    3 KB (377 words) - 14:56, 8 March 2023
  • Tube Furnace (Tystar 8300)
    ...haracterization Data, such as thermal oxidation times, can be found on the recipe page: * No recipe should be run with >1slpm gas flow without discussing with supervisor first
    4 KB (580 words) - 11:15, 7 March 2024
  • Plasma Activation (EVG 810)
    ...Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29|Oxygen Plasma Recipe]] page for standard EVG recipes.
    1 KB (172 words) - 11:06, 30 October 2023
  • ADT 7100 - Initial Setup Before Cutting
    ...yellow you can choose one of two routes. You can either create or load a recipe or load your sample. === Create a Recipe ===
    11 KB (2,072 words) - 09:50, 2 July 2021
  • Thermal Processing Recipes
    # Ready to load into Tystar quartz boats, run recipe on Tystar. *Recipe Name: '''''DRY1050'''''
    5 KB (713 words) - 16:24, 30 January 2024
  • Test Data of etching SiO2 with CHF3/CF4-ICP1
    |+'''ICP#1 Recipe:''' Alternate SiO<sub>2</sub> etch recipe with O2 included.
    7 KB (936 words) - 09:54, 12 January 2023
  • Contact Alignment Recipes
    ==Positive Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed--> ==Negative Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed-->
    9 KB (1,195 words) - 12:20, 1 December 2022
  • IBD: Calibrating Optical Thickness
    ...step in the IBD recipe, which will also change all "SiO2_dep" steps in the recipe. ...her film, in this case do an "TaO-FP", and apply the new TaO/4 time to the recipe.
    5 KB (758 words) - 10:19, 9 March 2024
  • Sputter 4 (AJA ATC 2200-V)
    ...te biasing and pre-cleaning. Samples can be heated to 800°C. The system is recipe driven and computer controlled for reproducible results. *Automatic wafer loading and recipe driven process control.
    3 KB (507 words) - 10:37, 30 August 2022
  • YES Recipe Screenshots: STD-N2-O2
    |[[File:STD-N2-O2-180C-3KW-1min - steps.jpg|alt=screenshot of recipe STD-N2-O2-180C-3KW-1min - steps|none|thumb|STD-N2-O2-180C-3KW-1min - steps]
    725 bytes (147 words) - 12:08, 30 November 2023
  • Filmetrics F50 - Operating Procedure
    ...recipe into a different name when the edit is done by clicking the '''Save Recipe as Different Filename''' icon at the top-left corner). ...ition as the origin for the map. This position is not saved as part of the recipe; B) '''Absolute-'''set a specific (x, y) location as the origin of the map.
    10 KB (1,570 words) - 13:43, 26 April 2019
  • Vapor HF Etch
    ...r_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29 Vapor HF Recipes] page for recipe specific to this tool.
    1 KB (240 words) - 10:53, 30 August 2022
  • Sputtering Recipes
    .../wiki/images/1/15/Fe_and_Co_Films_using_Sputter-3.pdf Fe and Co Deposition Recipe] ...notech.ucsb.edu/wiki/images/5/5e/Cu_Film_using_Sputter-3.pdf Cu Deposition Recipe]
    16 KB (2,290 words) - 21:36, 21 September 2023
  • Filmetrics F40-UV Quick Start
    ...ipe from the Dropdown list (ok to ''discard changes''), and Click '''[Edit Recipe…]''' to set the layers to approximately what you expect to measure. ...r too smooth, then your guess of thickness was not close enough - '''[Edit Recipe]''' & '''[Analyze]''' again until you get a good fit.
    4 KB (613 words) - 11:13, 31 May 2019
  • Rapid Thermal Processor (SSI Solaris 150)
    |recipe = Thermal Processing
    2 KB (248 words) - 08:36, 8 December 2023
  • PECVD 2 (Advanced Vacuum)
    **The Low-Stress Si3N4 film recipe are tested approx. monthly, and kept within ±100MPa. Data can be found at
    2 KB (284 words) - 10:30, 30 August 2022
  • Wafer scanning process traveler
    ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #**Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai
    33 KB (5,424 words) - 17:05, 4 January 2024
  • InP Etch Rate and Selectivity (InP/SiO2)
    ...plasma chamber clean for 15 minutes, then, chamber coating with the same recipe and a quarter dummy InP on carrier for 15 minutes.
    4 KB (459 words) - 18:00, 8 November 2021
  • Surface Analysis (KLA/Tencor Surfscan)
    ...8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
    3 KB (357 words) - 18:02, 2 February 2024
  • Dry Etching Recipes
    ...ll>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small>
    14 KB (1,875 words) - 15:31, 7 February 2024
  • Glossary
    ...ies events larger than the maximum particle size for a scan (as set by the recipe’s Area From parameter). Defect maps display areas as a series of chords. A recipe parameter that sets the maximum size for LPDs during data collection. Defec
    12 KB (2,034 words) - 09:25, 15 April 2020
  • Ellipsometer (Woollam) - Measuring thin metals with oxide pre-measurement
    |Normal "Cauchy on Silicon" recipe
    2 KB (343 words) - 15:39, 12 February 2024
  • E-Beam 3 (Temescal)
    ...visit the [[E-Beam_Evaporation_Recipes#Materials_Table_(E-Beam #3)|E-Beam Recipe Page]].
    2 KB (290 words) - 12:11, 8 September 2022
  • E-Beam 4 (CHA)
    ...visit the [[E-Beam_Evaporation_Recipes#Materials_Table_(E-Beam #4)|E-Beam Recipe Page]].
    2 KB (290 words) - 12:04, 11 April 2023
  • Vacuum Deposition Recipes
    ...ll>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small>
    24 KB (3,097 words) - 15:44, 7 July 2022
  • DUMMY TOOL
    |recipe =
    2 KB (311 words) - 01:11, 19 October 2022
  • ICP Etching Recipes
    ...tch_Bosch_DSEIII.pdf Bosch Process Recipe and Characterization] - Standard recipe on the tool. **Recipe Name: "'''''Plasma-Therm Standard DSE'''''" (''Production'' - copy to your
    28 KB (4,356 words) - 12:49, 7 May 2024
  • LegacyTable
    {{Recipe Table Explanation}}
    7 KB (841 words) - 17:19, 18 July 2013
  • Lift-Off with I-Line Imaging Resist + LOL2000 Underlayer
    ...re tool. You can find starting exposure parameters for SPR955CM-0.8 on the recipe pages for the exposure tool you are using: |SPR955CM-0.9 spin @ 3krpm (Spin Recipe #5)
    5 KB (854 words) - 14:58, 31 August 2022
  • E-Beam 1 (Sharon)
    ...the [[E-Beam_Evaporation_Recipes#Materials_Table_(E-Beam #1)|'''<u>E-Beam Recipe Page</u>''']], for the materials tables and deposition parameters for vario
    2 KB (359 words) - 16:03, 7 May 2024
  • Frequently Asked Questions
    ===Where do I find a recipe for a process (litho/etch/dep etc.)?=== ...mate only. '''''If you have tight tolerances, you need to characterize the recipe yourself''''' (ie. figure out deposition/etch rate, selectivity, verticalit
    25 KB (4,184 words) - 08:59, 21 November 2023
  • Sputter 5 (AJA ATC 2200-V)
    ...ls as well as the sputtering of a wide variety of materials. The system is recipe driven and computer controlled for reproducible results.
    3 KB (413 words) - 15:50, 16 September 2022
  • Thermal Evaporator 1
    ...ration_Recipes#Materials_Table_(Thermal Evaporator #1)|Thermal Evaporation Recipe Page]].
    2 KB (382 words) - 17:31, 12 October 2017
  • Test Data of etching SiO2 with CHF3/CF4
    *[[Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)|Test Data of etching SiO2 w
    7 KB (976 words) - 13:15, 11 January 2023
  • Thermal Evap 1
    ...ration_Recipes#Materials_Table_(Thermal Evaporator #1)|Thermal Evaporation Recipe Page]].
    3 KB (384 words) - 10:28, 30 August 2022
  • Unaxis VLR Etch - Process Control Data
    ...r to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes.
    5 KB (717 words) - 18:41, 21 November 2022
  • Sputter 3 (AJA ATC 2000-F)
    ...te biasing and pre-cleaning. Samples can be heated to 650°C. The system is recipe driven and computer controlled for reproducible results.
    3 KB (479 words) - 10:36, 30 August 2022
  • Stepper Recipes
    ...give you the values of the key parameters you will need to establish your recipe. Underlayers such as LOL2000 or PMGI can be used on the stepper systems. &n ==Positive Resist (GCA 6300)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed-->
    17 KB (2,294 words) - 17:03, 21 March 2024
  • Staff List
    ...s group provides expertise on process development, fabrication techniques, recipe development, and some direct tool training and maintenance. The Process Gro
    5 KB (664 words) - 09:42, 11 March 2024
  • Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)
    ...nanotech.ucsb.edu/w/images/6/65/Editing_a_Recipe_on_Plasma.pdf How to edit recipe]
    4 KB (603 words) - 13:09, 22 November 2023
  • Lift-Off with DUV Imaging + PMGI Underlayer
    Optionally can use lift-pins & Recipe "'''00 220deg, 3min Vac'''";
    4 KB (608 words) - 16:32, 27 April 2022
  • Packaging Recipes
    ...asily without aborting the programmed cuts. The "Height Check Rate" in the recipe will check the blade exposure after this many cuts, using the optical heigh ...opriate thickness, and spin-coat it & soft-bake it according to a standard recipe.
    10 KB (1,597 words) - 11:18, 1 May 2024
  • Lithography Recipes
    #*[[#Photolithography_Recipes |'''Photo Lithography Recipe section''']] ...ll>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small>
    23 KB (3,174 words) - 12:37, 9 May 2024
  • Stepper 1 (GCA 6300) - Standard Operating Procedure
    #Spin coat resist following the recipe for spinning/baking specific resist (make sure the resist is fresh) # When exposure is finished, follow the recipe (post exposure bake if needed) with development. Please take your time for
    15 KB (2,499 words) - 09:42, 19 March 2020
  • Stepper 2 (AutoStep 200)
    |recipe = Lithography
    6 KB (893 words) - 17:44, 12 February 2024
  • Stepper 3 (ASML DUV)
    |recipe = Lithography
    9 KB (1,400 words) - 13:08, 3 May 2024
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