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Welcome to the UCSB Nanofab Wiki
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             Equipment & Recipes
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Lab Rules

Equipment Status


NanoFab COVID Response

Following guidelines provided by our Office of Research, the UCSB Nanofabrication Facility is open only for limited/authorized use for critical activity at this time.

Contact the Lab Director for more information.

// John d 15:00, 19 July 2020 (PDT)

ASML Maintenance: Aug. 11-15th

ASML will be performing a PM from Tues. Aug. 11th to Sat. Aug. 15th. // John d 14:50, 19 July 2020 (PDT)

New Tool Installations

See the News Feed for info on two upcoming tool installations! We have a Raith Velion FIB and a Heidelberg MLA150 Maskless Aligner on the way.

// John d 17:48, 2 June 2020 (PDT)

Unaxis ICP-PECVD

The ICP-PECVD module is available upon request. Contact Tony Bosch if interested. System is using deuterated Silane for low loss optical films use only.

// Thibeault 14:22, 26 March 2020 (PDT)

How to use this wiki

  • The Nanofab Wiki consists of resources to help our users work better. Here you can find MSDS sheets, information on all the tools in the lab and contact information for all our staff.
  • This wiki site has extensive safety related information on common hazards and work practices and procedures within the facility. All facility users should be familiar with the information as relates to their work.
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  • Users are encouraged to add well qualified process data to the Wiki Processes pages. The Wiki becomes more useful as more in house processes are developed and included in this database.
  • We also welcome device process flow sheets from dissertations for any device types made in the facility.

  • Since there are many users of the facility, with their own unique projects, the management of the facility cannot be responsible for overseeing all aspects of their work.
  • Therefore, the supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.
  • They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations.
  • The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans.


News & Announcements

News from the U.C. Santa Barbara Nanofabrication Facility.

Raith Velion: FIB/SEM Installation

You may have noticed the huge RAITH crates outside the NanoFab; in the next few months we will be installing this state-of-the-art focused ion beam/electron beam tool in Bay 1.

Learn more about this upcoming capability at the Raith website:

Dr. Dan Read will be the resident expert on this exciting new technology.

// John d 18:08, 8 June 2020 (PDT)

Heidelberg MLA-150: Delivery Scheduled for Sept.

We now have a delivery date for our Heidelberg Maskless Aligner (MLA150), September 2020! This tool enables flexible I-Line lithography, in which a user can align to arbitrary features (eg. 2D materials, quantum dots), upload a CAD file to write a pattern without ordering a mask plate, grey-scale lithography and continuous auto-focus on non-planar substrates.

Learn more about the tool at the Heidelberg Instruments website:

// John d 17:43, 2 June 2020 (PDT)

TechTalk: Dr. Renan Moreira & Grégoire Coiffard

Tech Talks on Thurs Dec 5th, in ESB room 1001 (click for more info):

12n: Dr. Renan Moreira, ULL Technologies: “Ultra-low loss photonic integrated circuits based on Si3N4 waveguides”

1245pm: Grégoire Coiffard, Mazin Group, Physics Dept. UCSB, “The fabrication of 20,000 pixel kinetic inductance detector arrays for near-IR to visible astronomy” // John d 11:03, 5 December 2019 (PDT)

New Plasma Asher Installation

A new YES EcoClean Plasma Strip/Descum System is being installed, for controlled photoresist etching & residue stripping. We will make an announcement when the system has been qualified and is ready for use. // John d 11:03, 7 August 2019 (PDT)

Rapid Thermal Annealer Installed

We are installing and qualifying a new SSI Solaris 150 Rapid Thermal Processor. We will make an announcement when the system is ready and trainings are scheduled. See the SSI RTP Wiki Page here. // John d 12:03, 28 May 2019 (PDT)

S-Cubed Spin/Coat/Dev Station Installation

We are currently in the process of installing a Cube system for automated Spin Coating, Baking, Developing and Edge-Bead Removal on 4-inch and 6-inch wafers. Initially this tool will be solely purposed for Staff and the use of the sponsor, primarily for ASML DUV Stepper wafer prep. As procedures are developed, the system will be opened up for use by all ASML Stepper users, and may eventually be opened for I-Line stepper use as well. // John d 12:10, 20 February 2019 (PST)

Filmetrics Optical Measurement Systems

A Filmetrics F10-RT for optical reflection/transmission spectra, and a Filmetrics F50 thin-film wafer-mapping system have been installed. Contact Ning Cao for more info. // John d 15:24, 12 December 2018 (PST)

KLA Tencor Profilometer Installed

We have installed a new KLA Tencor Stylus Profilometer, that has been installed in Bay 4. Contact Brian Lingg for training. // John d 17:28, 12 September 2018 (PDT)

Laser Endpoint Monitors

We've installed new Intellemetrics LEP500 Laser Endpoint Detection monitoring on the DSEiii & ICP#2 & ICP#1 etchers. This allows you to terminate your etch at a calibrated/modeled distance into a layer, and removes the need to calibrate etch rates for most processes. // John d 09:26, 17 July 2018 (PDT)

Metal Processes on the Atomic Layer Deposition

We now have Ruthenium (Ru) and Platinum (Pt) metal depositions developed on the Oxford FlexAL ALD tool. See the Atomic Layer Deposition: Recipes page or contact Bill Mitchell for more information. // Posted: 16:07, 01 June 2017 (PST)

New Deep Silicon Etcher Online

A new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. An Intellemetrics LEP500 laser end point monitor has also been installed on the system. // Posted: 22:16, 27 November 2017 (PST)

2016 Survey Results

See the May 2016 User Survey Results. // Posted: 12:00, 01 May 2016 (PST)

CAIBE Ion Mill Available

The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. // Posted: 12:00, 01 July 2015 (PST)

NanoFiles SFTP Online

Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. // Posted: 12:00, 07 July 2013 (PST)

For any questions, comments or concerns regarding the wiki, please contact the Wiki Admin.