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Filmetrics F50: Down

The F50-WaferMapper’s laptop has a computer/RAM failure - we are working on a repair. //Vraj Mehalana 11:09, 21 March 2023 (PDT)

FEI SEM#1 Replacement Project

The FEI SEM #1 will be removed and replaced starting Friday March 17th. Both SEMs will be shut down and the SEM room will be off limits beginning at 8 am Friday and return to normal operations Tuesday morning the 21st. //Vraj Mehalana 10:55, 16 March 2023 (PDT)

Unaxis Etch: Down

We had to take the VAT controller off of this module to get the ICP-PECVD running. I have no immediate ETA for this system coming back online. Until we get this system running again you will need to use the Oxford Cobra system. -- Tony // John d 09:35, 13 February 2023 (PST)

Dektak XT ready for training

We have replaced the Dektak 6M with a new Dektak XT profilometer. The system is available for training, please contact the tool supervisor. // John d 10:08, 7 February 2023 (PST)

Au Plating: UP

only the full 100mm wafer fixture is available at the moment. You can plate smaller pieces on it with no issues. // Vraj Mehalana 12:35, 15 March 2023 (PDT)

General Information

NanoFab Users are responsible for understanding their chemistry, risks and usage of various chemicals. Please read the MSDS sheets for the chemicals you use!
Users can add qualified processing data to the Wiki pages; see the Editing_Tutorials for how to do that.

Supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.
They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations.
The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans.

News & Announcements

News from the U.C. Santa Barbara Nanofabrication Facility.

Dektak XT installed

We have replaced the old Dektak 6M with a new Dektak XT profilometer. This tool will provide robust, fast metrology for rapid in-process topography inspection. // John d 10:41, 25 January 2023 (PST)

New Process Control data tables

We have added "Process Control Data" - data on deposition/etch repeatability - to a number of our highest used etchers and deposition tools. The datasheets are linked in multiple places, mainly on the Recipes pages for each tool, or on the general Recipes pages for Deposition Recipes or Etch Recipes. // John d 16:07, 5 January 2023 (PST)

Oxford PlasmaPro ICP Etcher installed

We have a new ICP etcher in Bay 2: Oxford_ICP_Etcher_(PlasmaPro_100_Cobra)

The tool has been qualified for InP Ridge and InGaAsP Grating etches, and is intended for III-V etching in general (GaAs, GaN, GaSb etc.)

In addition, the tool is capable of Atomic Layer Etching on various materials. Contact the supervisor for training. // John d 11:27, 29 September 2021 (PDT)

SiO2 etching, High-Aspect Ratio

Dr. Bill Mitchell recently published an article detailing high-aspect ratio SiO2 etching (JVST-A, May 2021) in the Plasma-Therm Fluorine ICP etcher, using a novel Ruthenium Hard Mask.

Ruthenium can be deposited using the Oxford ALD or AJA Sputter and etched in one of the Panasonic ICP's.

You can find a full process flow at the FL-ICP's Recipe Page, in this case using a Sputtered Ru hard mask and I-line stepper lithography. // John d 08:05, 27 May 2021 (PDT)

Wafer Polisher available

We have added an Allied Wafer Polish tool to our equipment list. Contact Bill_Millerski for more information. // John d 16:49, 10 May 2021 (PDT)

Digital Microscope: Olympus DSX-1000

You'll see a new digital microscope in Bay 4/Metrology, that's our new Olympus DSX-1000. We are currently developing procedures, keep an eye out for training emails. // John d 13:49, 8 April 2021 (PDT)

Raith Velion: FIB/SEM Installation

We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography.

Learn more about the tool's capabilities at the Raith website:

Tool qualification is currently underway. Dr. Dan Read is the resident expert on this new tool.

// John d 06:53, 30 November 2020 (PST)

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