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  • Other Dry Etching Recipes
    ...tps://wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe] ...ch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO<sub>2</sub> Etch Recipe 1]
    1 KB (178 words) - 08:17, 9 December 2022
  • ADT 7100 - Recovering an Old Recipe (2019)
    # Go to any recipe # Click 'Recipe Import'[[File:Recipe import.png]]
    487 bytes (77 words) - 03:15, 27 March 2019
  • PECVD1 Recipes
    *[[ media: NewPECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] *[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Recipe]]
    2 KB (250 words) - 16:22, 8 January 2015
  • PECV1 Wafer Coating Process Traveler
    [[Table SiO2 recipe]]
    21 bytes (3 words) - 16:00, 30 March 2020
  • PECVD1-SiN standard recipe.pdf
    ...//drive.google.com/?tab=mo&authuser=0#my-drive=sharing PECVD1-SIN Standard Recipe]
    90 bytes (13 words) - 15:21, 18 March 2014
  • PECVD1 Wafer Coating Process Traveler
    * Seasoning recipe name: * Deposition recipe name:
    2 KB (325 words) - 16:38, 30 March 2020
  • PECVD1-SIN Standard Recipe (PlasmaTherm 790)
    ...uBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing PECVD1-SiN Standard Recipe Spreadsheet]
    174 bytes (20 words) - 15:37, 18 March 2014
  • PECVD1 Wafer Coating Process
    #* Load the seasoning recipe (SiN seasoning), and run it. The goal of this step is to coat chamber walls #* Load the deposition recipe (SiN@250C), and run it. Deposition time is variable. Get the rate from [htt
    2 KB (270 words) - 13:16, 10 December 2020
  • OLD - PECVD2 Recipes
    *[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]] *[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
    1 KB (189 words) - 12:28, 3 March 2022
  • Wafer Coating Process Traveler
    #*Load the seasoning recipe (STD SiO2), and run it. The goal of this step is to coat oxide on chamber w #*Load the deposition recipe (STD SiO2), and run it. Deposition time is variable. Get the rate from [htt
    3 KB (416 words) - 16:54, 22 April 2020
  • RIE Etching Recipes
    *[//wiki.nanotech.ucsb.edu/w/images/b/b4/ZnS_Plasma_Etch-1.pdf ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar] ....edu/w/images/2/2f/SiO2-Etch-Recipe-using-RIE-3-a.pdf SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]
    2 KB (253 words) - 10:02, 14 June 2021
  • Wafer Coating Process Traveler1
    * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min''' * Deposition recipe name: '''SiO2 LDR 250°C, t=780 sec'''
    4 KB (711 words) - 13:32, 30 March 2020
  • RIE5 - Standard Operating procedure (Cortex Software)
    # Choose a recipe to run from the '''Recipe''' menu list. # Choose a recipe to run from the list of available recipes.
    2 KB (377 words) - 14:09, 17 October 2018
  • PECVD Recipes
    ...E_917R6jF_K-btCHjsiIM/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
    14 KB (2,130 words) - 10:28, 20 December 2023
  • Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond
    * Set up POLOS recipe * Run recipe:
    823 bytes (131 words) - 08:12, 11 August 2020
  • CDE ResMap Quick-Start instructions
    ...as location - 800px annot quarterwf.png|none|thumb|200x200px|Quarter Wafer recipe measurement location]] # Select Operator > Run Recipe
    1 KB (214 words) - 13:01, 17 April 2018
  • Unaxis wafer coating procedure
    ...of Dec. 2019), users may '''only edit <u>Deposition Time</u>''', no other recipe modifications or customizations are permitted without staff approval. * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''
    5 KB (801 words) - 21:29, 12 August 2020
  • Atomic Layer Deposition Recipes
    ...ction. This Ozone-generator must be manually turned on before running the recipe - check with [[Atomic Layer Deposition (Oxford FlexAL)|supervisor]] for det For some recipes such as TiN, there are two loops in the recipe. The outermost loop controls the total thickness of the film, the inner lo
    7 KB (1,104 words) - 10:27, 15 June 2023
  • Wafer Scanning process Traveler
    ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai
    2 KB (339 words) - 11:31, 22 April 2020
  • Wafer Scanning/Coating Process Traveler ( combined/less detailed)
    * Example of how to run process for the standard recipe "SiO2 LDR 250°C" ** Load seasoning recipe " SiO2 seasoning" , time=2min
    3 KB (515 words) - 13:41, 20 April 2020
  • Old Deposition Data - NastaziaM 2021-11-22
    * SiO<sub>2</sub> [PECVD 1] Standard Recipe * Si<sub>3</sub>N<sub>4</sub> [PECVD 1] Standard Recipe
    36 KB (5,386 words) - 09:31, 14 December 2021
  • S-Cubed Flexi - Operating Procedure
    ...k if hot plates are set to the needs temperatures. If not, run Temp-change recipe: #run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.
    2 KB (396 words) - 14:39, 8 November 2022
  • Oxygen Plasma System Recipes
    Recipe Temperature control is by the lift-pins , with hotplate at 200°C ====Recipe Names:====
    6 KB (887 words) - 13:55, 1 March 2024
  • Automated Coat/Develop System (S-Cubed Flexi)
    |recipe = Lithography ...cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamina
    2 KB (340 words) - 14:41, 8 November 2022
  • Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers
    ...transfers of wafers in/out of the chamber, and manual ending of a running recipe, so specific detailed instructions are not necessary.
    422 bytes (69 words) - 11:11, 8 June 2020
  • Deposition Data - temporary 2021-12-15
    ...t0ovP0MtpFtICjpH0-prs/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
    17 KB (2,624 words) - 00:07, 16 December 2021
  • Wafer Bonder (SUSS SB6-8E)
    ...em is computer controlled with a windows environment allowing for multiple recipe steps and saving of recipes and data. The system is configured for manual l ...i.nanofab.ucsb.edu/w/images/5/5c/Suss_Bonder_Recipe_Guidelines.docx Bonder Recipe Guidelines]
    2 KB (229 words) - 10:53, 20 September 2023
  • Dicing Saw (ADT)
    *[[ADT 7100 - Recovering an Old Recipe (2019)|Recovering an Old Recipe]]
    2 KB (273 words) - 15:11, 17 October 2023
  • Filmetrics F10-RT-UVX Operating Procedure
    ...or Reflectance measurement by clicking '''Spectra''' button, then, '''Edit Recipe''' button, then, '''Acquisition Settings''' tab. # Click '''Edit Recipe''' button, then, edit the model according to your film sample (suck as film
    4 KB (664 words) - 12:52, 4 September 2021
  • Old Deposition Data - 2021-12-15
    ...ts/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si3N4 Standard Recipe] ...ets/d/1uqpg3sirsRbXdTFlxZ6_k3t0ovP0MtpFtICjpH0-prs/edit#gid= SiO2 Standard Recipe]
    31 KB (4,516 words) - 00:18, 16 December 2021
  • KLA Tencor P7 - Basic profile instructions
    #From the main Profiler screen, select scan recipe. #Single click a scan recipe based on the total height of the structure to be measured.
    2 KB (336 words) - 15:20, 2 November 2022
  • Oxford ICP Etcher (PlasmaPro 100 Cobra)
    **GaAs-baased epitaxies - ''starter recipe is available'' **GaN-based epitaxies - ''starter recipe is available''
    4 KB (532 words) - 23:33, 4 May 2023
  • Intellemetrics Laser Etch Monitor Procedure for Panasonic ICP Etchers
    === Laser Monitor & Recipe setup === ...Time is longer than expected, to stop using the Manual Box instead of the recipe time.
    6 KB (876 words) - 14:23, 13 June 2019
  • Atomic Layer Deposition (Oxford FlexAL)
    **Includes recipe names for various films, and approx. dep. rates ...regime is rather complex. [[Bill Mitchell]] is the resident expert on ALD recipe development.
    3 KB (377 words) - 14:56, 8 March 2023
  • Tube Furnace (Tystar 8300)
    ...haracterization Data, such as thermal oxidation times, can be found on the recipe page: * No recipe should be run with >1slpm gas flow without discussing with supervisor first
    4 KB (580 words) - 11:15, 7 March 2024
  • Plasma Activation (EVG 810)
    ...Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29|Oxygen Plasma Recipe]] page for standard EVG recipes.
    1 KB (172 words) - 11:06, 30 October 2023
  • ADT 7100 - Initial Setup Before Cutting
    ...yellow you can choose one of two routes. You can either create or load a recipe or load your sample. === Create a Recipe ===
    11 KB (2,072 words) - 09:50, 2 July 2021
  • Thermal Processing Recipes
    # Ready to load into Tystar quartz boats, run recipe on Tystar. *Recipe Name: '''''DRY1050'''''
    5 KB (713 words) - 16:24, 30 January 2024
  • Test Data of etching SiO2 with CHF3/CF4-ICP1
    |+'''ICP#1 Recipe:''' Alternate SiO<sub>2</sub> etch recipe with O2 included.
    7 KB (936 words) - 09:54, 12 January 2023
  • Contact Alignment Recipes
    ==Positive Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed--> ==Negative Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed-->
    9 KB (1,195 words) - 12:20, 1 December 2022
  • IBD: Calibrating Optical Thickness
    ...step in the IBD recipe, which will also change all "SiO2_dep" steps in the recipe. ...her film, in this case do an "TaO-FP", and apply the new TaO/4 time to the recipe.
    5 KB (758 words) - 10:19, 9 March 2024
  • Sputter 4 (AJA ATC 2200-V)
    ...te biasing and pre-cleaning. Samples can be heated to 800°C. The system is recipe driven and computer controlled for reproducible results. *Automatic wafer loading and recipe driven process control.
    3 KB (507 words) - 10:37, 30 August 2022
  • YES Recipe Screenshots: STD-N2-O2
    |[[File:STD-N2-O2-180C-3KW-1min - steps.jpg|alt=screenshot of recipe STD-N2-O2-180C-3KW-1min - steps|none|thumb|STD-N2-O2-180C-3KW-1min - steps]
    725 bytes (147 words) - 12:08, 30 November 2023
  • Filmetrics F50 - Operating Procedure
    ...recipe into a different name when the edit is done by clicking the '''Save Recipe as Different Filename''' icon at the top-left corner). ...ition as the origin for the map. This position is not saved as part of the recipe; B) '''Absolute-'''set a specific (x, y) location as the origin of the map.
    10 KB (1,570 words) - 13:43, 26 April 2019
  • Vapor HF Etch
    ...r_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29 Vapor HF Recipes] page for recipe specific to this tool.
    1 KB (240 words) - 10:53, 30 August 2022
  • Sputtering Recipes
    .../wiki/images/1/15/Fe_and_Co_Films_using_Sputter-3.pdf Fe and Co Deposition Recipe] ...notech.ucsb.edu/wiki/images/5/5e/Cu_Film_using_Sputter-3.pdf Cu Deposition Recipe]
    16 KB (2,290 words) - 21:36, 21 September 2023
  • Filmetrics F40-UV Quick Start
    ...ipe from the Dropdown list (ok to ''discard changes''), and Click '''[Edit Recipe…]''' to set the layers to approximately what you expect to measure. ...r too smooth, then your guess of thickness was not close enough - '''[Edit Recipe]''' & '''[Analyze]''' again until you get a good fit.
    4 KB (613 words) - 11:13, 31 May 2019
  • Rapid Thermal Processor (SSI Solaris 150)
    |recipe = Thermal Processing
    2 KB (248 words) - 08:36, 8 December 2023
  • PECVD 2 (Advanced Vacuum)
    **The Low-Stress Si3N4 film recipe are tested approx. monthly, and kept within ±100MPa. Data can be found at
    2 KB (284 words) - 10:30, 30 August 2022
  • Wafer scanning process traveler
    ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #**Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai
    33 KB (5,424 words) - 17:05, 4 January 2024

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