Difference between revisions of "Tool List"

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(Undo revision 598 by Zwarburg (Talk))
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|}
 
|}
   
=Vacuum Deposition=
+
= Vacuum Deposition =
  +
 
{|
 
{|
|-valign="top"
+
|- valign="top"
|width=300|
+
| width="300" |
* [[E-Beam 1 (Sharon)]]
+
*[[E-Beam 1 (Sharon)]]
* [[E-Beam 2 (Custom)]]
+
*[[E-Beam 2 (Custom)]]
* [[E-Beam 3 (Temescal)]]
+
*[[E-Beam 3 (Temescal)]]
* [[E-Beam 4 (CHA)]]
+
*[[E-Beam 4 (CHA)]]
* [[Sputter 1 (Custom)]]
+
*[[Sputter 1 (Custom)]]
* [[Sputter 2 (SFI Endeavor)]]
+
*[[Sputter 2 (SFI Endeavor)]]
* [[Sputter 3 (AJA)]]
+
*[[Sputter 3 (ATC 2000-F)]]
* [[Sputter 4 (AJA)]]
+
*[[Sputter 4 (ATC 2200-V)]]
* [[Sputter 5 (Lesker AXXIS)]]
+
*[[Sputter 5 (Lesker AXXIS)]]
  +
|width=400|
 
  +
| width="400" |
* [[PECVD 1 (PlasmaTherm 790)]]
 
* [[PECVD 2 (Advanced Vacuum)]]
+
*[[PECVD 1 (PlasmaTherm 790)]]
  +
*[[PECVD 2 (Advanced Vacuum)]]
* [[Thermal Evap 1]]
 
* [[Thermal Evap 2]]
+
*[[Thermal Evap 1]]
* [[Unaxis VLR ICP-PECVD]]
+
*[[Thermal Evap 2]]
  +
*[[Unaxis VLR ICP-PECVD]]
* [[Ion Beam Deposition (Veeco NEXUS)]]
 
* [[Molecular Vapor Deposition]]
+
*[[Ion Beam Deposition (Veeco NEXUS)]]
  +
*[[Molecular Vapor Deposition]]
* [[Atomic Layer Deposision (Oxford FlexAL)]]
 
  +
*[[Atomic Layer Deposision (Oxford FlexAL)]]
|-
 
  +
 
|}
 
|}
   
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| width="400" |
 
| width="400" |
*[[ICP Etch 1 (Panasonic E620)]]
+
*[[ICP Etch 1 (Panasonic E626I)]]
*[[ICP Etch 2 (Panasonic E626)]]
+
*[[ICP Etch 2 (Panasonic E640)]]
 
*[[UV Ozone Reactor]]
 
*[[UV Ozone Reactor]]
 
*[[Plasma Clean (Gasonics 2000)]]
 
*[[Plasma Clean (Gasonics 2000)]]
Line 119: Line 121:
 
* [[Optical Film Thickness (Nanometric)]]
 
* [[Optical Film Thickness (Nanometric)]]
 
* [[Scanning Probe Microscope (Veeco NanoMan)]]
 
* [[Scanning Probe Microscope (Veeco NanoMan)]]
  +
* [[ Surfscan 6200]]
 
|width=400|
 
|width=400|
 
* [[Tencor Flexus Film Stress]]
 
* [[Tencor Flexus Film Stress]]

Revision as of 06:17, 10 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization