Difference between revisions of "Tool List"
Jump to navigation
Jump to search
(→Other Patterning Systems: Link to Maskless Aligner (Heidelberg MLA150)) |
(Text replacement - "/wiki/index.php" to "/w/index.php") |
||
(12 intermediate revisions by 4 users not shown) | |||
Line 7: | Line 7: | ||
=====Photoresists and Lithography Chemicals===== |
=====Photoresists and Lithography Chemicals===== |
||
− | *See the [https://wiki.nanotech.ucsb.edu/ |
+ | *See the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page]. |
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]] |
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]] |
||
Line 17: | Line 17: | ||
*[[DUV Flood Expose]] |
*[[DUV Flood Expose]] |
||
− | ===== |
+ | =====Direct-Write Lithography===== |
*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
*[[E-Beam Lithography System (JEOL JBX-6300FS)]] |
||
Line 23: | Line 23: | ||
*[[Focused Ion-Beam Lithography (Raith Velion)]] |
*[[Focused Ion-Beam Lithography (Raith Velion)]] |
||
*[[Maskless Aligner (Heidelberg MLA150)]] |
*[[Maskless Aligner (Heidelberg MLA150)]] |
||
+ | |||
− | *[[Nano-Imprint (Nanonex NX2000)]] |
||
+ | =====Other Patterning Systems===== |
||
+ | |||
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]] |
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]] |
||
| width="400" | |
| width="400" | |
||
Line 43: | Line 45: | ||
=====Lithography Support===== |
=====Lithography Support===== |
||
− | *The [https://wiki.nanotech.ucsb.edu/ |
+ | *The [https://wiki.nanotech.ucsb.edu/w/index.php?title=Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes. |
− | *[https://signupmonkey.ece.ucsb.edu/ |
+ | *[https://signupmonkey.ece.ucsb.edu/w/index.php?title=Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches |
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]] |
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]] |
||
|- |
|- |
||
Line 110: | Line 112: | ||
*[[ICP Etch 2 (Panasonic E640)]] |
*[[ICP Etch 2 (Panasonic E640)]] |
||
*[[ICP-Etch (Unaxis VLR)]] |
*[[ICP-Etch (Unaxis VLR)]] |
||
+ | *[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]] |
||
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]] |
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]] |
||
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]] |
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]] |
||
Line 142: | Line 145: | ||
*[[Spin Rinse Dryer (SemiTool)]] |
*[[Spin Rinse Dryer (SemiTool)]] |
||
*[[Chemical-Mechanical Polisher (Logitech)]] |
*[[Chemical-Mechanical Polisher (Logitech)]] |
||
+ | *[[Mechanical Polisher (Allied)]] |
||
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]] |
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]] |
||
− | *[https://signupmonkey.ece.ucsb.edu/ |
+ | *[https://signupmonkey.ece.ucsb.edu/w/index.php?title=Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)] |
|- |
|- |
||
|} |
|} |
||
Line 187: | Line 191: | ||
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
||
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]] |
||
+ | *[[Digital Microscope (Olympus DSX1000)|Digital Microscope #7 (Olympus DSX1000)]] |
||
+ | |||
⚫ | |||
⚫ | |||
*[[Field Emission SEM 1 (FEI Sirion)]] |
*[[Field Emission SEM 1 (FEI Sirion)]] |
||
*[[Field Emission SEM 2 (JEOL 7600F)]] |
*[[Field Emission SEM 2 (JEOL 7600F)]] |
||
Line 204: | Line 210: | ||
=====Thin-Film/Material Analysis===== |
=====Thin-Film/Material Analysis===== |
||
− | ====== |
+ | ======Thickness + Optical Constants====== |
+ | |||
*[[Ellipsometer (Woollam)]] |
*[[Ellipsometer (Woollam)]] |
||
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]] |
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]] |
||
Line 212: | Line 219: | ||
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]] |
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]] |
||
− | ====== |
+ | ======Other Properties====== |
+ | |||
*[[Film Stress (Tencor Flexus)]] |
*[[Film Stress (Tencor Flexus)]] |
||
*[[Photoluminescence PL Setup (Custom)]] |
*[[Photoluminescence PL Setup (Custom)]] |
||
− | ====== |
+ | ======Electrical Analysis====== |
+ | |||
*[[Resistivity Mapper (CDE RESMAP)]] |
*[[Resistivity Mapper (CDE RESMAP)]] |
||
*[[Probe Station & Curve Tracer]] |
*[[Probe Station & Curve Tracer]] |
Revision as of 12:50, 4 September 2021
Lithography
Photoresists and Lithography ChemicalsContact Aligners (Optical Exposure)Direct-Write Lithography
Other Patterning Systems |
Steppers (Optical Exposure)Thermal Processing for Photolithography
Lithography Support
|
Vacuum Deposition
Physical Vapor Deposition (PVD)
Sputter Deposition |
Chemical Vapor Deposition (CVD) |
Dry Etch
Reactive Ion Etching (RIE)Plasma Etching and Cleaning
Etch Monitoring
|
ICP-RIE
Ion Milling and Reactive Ion Beam EtchingOther Dry Etching |
Wet Processing
See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.
Thermal Processing
Packaging
Inspection, Test and Characterization
Optical Microscopy
Electron MicroscopyTopographical Metrology |
Thin-Film/Material AnalysisThickness + Optical Constants
Other PropertiesElectrical AnalysisOther Tools
|