Search results
Jump to navigation
Jump to search
- * SiO<sub>2</sub> [PECVD 1] Standard Recipe * Si<sub>3</sub>N<sub>4</sub> [PECVD 1] Standard Recipe36 KB (5,386 words) - 09:31, 14 December 2021
- ...k if hot plates are set to the needs temperatures. If not, run Temp-change recipe: #run recipe: Staff>SET-<HP#>-<TEMP> recipe corresponding to needed temp.2 KB (396 words) - 14:39, 8 November 2022
- Recipe Temperature control is by the lift-pins , with hotplate at 200°C ====Recipe Names:====6 KB (887 words) - 13:55, 1 March 2024
- |recipe = Lithography ...cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamina2 KB (340 words) - 14:41, 8 November 2022
- ...transfers of wafers in/out of the chamber, and manual ending of a running recipe, so specific detailed instructions are not necessary.422 bytes (69 words) - 11:11, 8 June 2020
- ...t0ovP0MtpFtICjpH0-prs/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]17 KB (2,624 words) - 00:07, 16 December 2021
- ...em is computer controlled with a windows environment allowing for multiple recipe steps and saving of recipes and data. The system is configured for manual l ...i.nanofab.ucsb.edu/w/images/5/5c/Suss_Bonder_Recipe_Guidelines.docx Bonder Recipe Guidelines]2 KB (229 words) - 10:53, 20 September 2023
- *[[ADT 7100 - Recovering an Old Recipe (2019)|Recovering an Old Recipe]]2 KB (273 words) - 15:11, 17 October 2023
- ...or Reflectance measurement by clicking '''Spectra''' button, then, '''Edit Recipe''' button, then, '''Acquisition Settings''' tab. # Click '''Edit Recipe''' button, then, edit the model according to your film sample (suck as film4 KB (664 words) - 12:52, 4 September 2021
- ...ts/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si3N4 Standard Recipe] ...ets/d/1uqpg3sirsRbXdTFlxZ6_k3t0ovP0MtpFtICjpH0-prs/edit#gid= SiO2 Standard Recipe]31 KB (4,516 words) - 00:18, 16 December 2021
- #From the main Profiler screen, select scan recipe. #Single click a scan recipe based on the total height of the structure to be measured.2 KB (336 words) - 15:20, 2 November 2022
- **GaAs-baased epitaxies - ''starter recipe is available'' **GaN-based epitaxies - ''starter recipe is available''4 KB (532 words) - 23:33, 4 May 2023
- === Laser Monitor & Recipe setup === ...Time is longer than expected, to stop using the Manual Box instead of the recipe time.6 KB (876 words) - 14:23, 13 June 2019
- **Includes recipe names for various films, and approx. dep. rates ...regime is rather complex. [[Bill Mitchell]] is the resident expert on ALD recipe development.3 KB (377 words) - 14:56, 8 March 2023
- ...haracterization Data, such as thermal oxidation times, can be found on the recipe page: * No recipe should be run with >1slpm gas flow without discussing with supervisor first4 KB (580 words) - 11:15, 7 March 2024
- ...Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29|Oxygen Plasma Recipe]] page for standard EVG recipes.1 KB (172 words) - 11:06, 30 October 2023
- ...yellow you can choose one of two routes. You can either create or load a recipe or load your sample. === Create a Recipe ===11 KB (2,072 words) - 09:50, 2 July 2021
- # Ready to load into Tystar quartz boats, run recipe on Tystar. *Recipe Name: '''''DRY1050'''''5 KB (713 words) - 16:24, 30 January 2024
- |+'''ICP#1 Recipe:''' Alternate SiO<sub>2</sub> etch recipe with O2 included.7 KB (936 words) - 09:54, 12 January 2023
- ==Positive Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed--> ==Negative Resist (MJB-3)== <!--Note that if this heading is changed, the recipe links on the Lithography page must be changed-->9 KB (1,195 words) - 12:20, 1 December 2022