Difference between revisions of "Tool List"
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*[[ICP Etch 1 (Panasonic E626I)]] | *[[ICP Etch 1 (Panasonic E626I)]] | ||
− | *[[ICP Etch 2 (Panasonic | + | *[[ICP Etch 2 (Panasonic E640)]] |
*[[ICP-Etch (Unaxis VLR)]] | *[[ICP-Etch (Unaxis VLR)]] | ||
*[[Plasma Clean (Gasonics 2000)]] | *[[Plasma Clean (Gasonics 2000)]] |
Revision as of 15:44, 17 May 2016
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)
- Wafer Bonder (SUSS SB6-8E)