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- 16:08, 21 March 2022 diff hist -438 Template:Announcements New COVID letter from chancellor. deleted ASML maint. LEXT down.
- 17:06, 3 March 2022 diff hist +9 Chemical-Mechanical Polisher (Logitech) link to Logitech Bonder Tag: Visual edit
- 17:04, 3 March 2022 diff hist +126 Wafer Bonder (Logitech WBS7) →About: links to applicable tools Tag: Visual edit
- 12:45, 3 March 2022 diff hist 0 PECVD Recipes →Low-Stress SiN deposition (PECVD #2): bullet formatting Tag: Visual edit: Switched
- 12:31, 3 March 2022 diff hist +178 PECVD Recipes →PECVD 2 (Advanced Vacuum): link to LS-SiN plots Tag: Visual edit
- 12:28, 3 March 2022 diff hist 0 m OLD - PECVD2 Recipes John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only current
- 15:06, 1 March 2022 diff hist +2 Tool List →Packaging: fixed FLip-scribe link Tag: Visual edit
- 15:06, 1 March 2022 diff hist 0 m Wafer Cleaver (PELCO Flip-Scribe) John d moved page Wafer Cleaver (PELCO LatticeAx) to Wafer Cleaver (PELCO Flip-Scribe) without leaving a redirect: wrong name
- 14:59, 1 March 2022 diff hist +646 KLayout Design Tips Added Editing Mode Tag: Visual edit
- 09:46, 1 March 2022 diff hist +303 Wafer Cleaver (PELCO Flip-Scribe) LatticeAx --> Flip-Scribe Tag: Visual edit
- 09:43, 1 March 2022 diff hist +115 Wafer Cleaver (PELCO Flip-Scribe) links to Mfg
- 09:35, 1 March 2022 diff hist +43 N File:LatticeAx.jpg Image of PELCO LAtticeAx tool current
- 09:27, 1 March 2022 diff hist +864 N Wafer Cleaver (PELCO Flip-Scribe) new tool page
- 09:20, 1 March 2022 diff hist +243 Tool List →Packaging: added sub-categories, Linked to new LatticeAx tool Tag: Visual edit
- 08:56, 1 March 2022 diff hist +130 m Contact Aligner (SUSS MA-6) →About: minor rearrangement Tag: Visual edit
- 08:52, 1 March 2022 diff hist +62 m Contact Aligner (SUSS MA-6) linked to SB6 Bonder page Tag: Visual edit
- 16:08, 28 February 2022 diff hist +462 Step Profilometer (KLA Tencor P-7) →Detailed Specifications: added basic info Tag: Visual edit
- 08:59, 26 February 2022 diff hist +27 m ICP Etching Recipes →Old Deleted Recipes: changed "don" to "supervisor" Tag: Visual edit
- 09:44, 21 February 2022 diff hist +108 Process Group - Remote Fabrication Jobs link to takss/priority list Tag: Visual edit
- 13:44, 17 February 2022 diff hist +327 ICP-PECVD (Unaxis VLR) →About: mention SiD4 config and expense/applicaiton Tag: Visual edit
- 13:43, 17 February 2022 diff hist +116 PECVD Recipes →ICP-PECVD (Unaxis VLR): mention cost/application to optics Tag: Visual edit
- 18:03, 16 February 2022 diff hist +340 Maskless Aligner (Heidelberg MLA150) added minimum fearture size and note on DSP transparent substrates Tag: Visual edit
- 11:48, 14 February 2022 diff hist +72 N File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current Tag: New redirect
- 11:48, 14 February 2022 diff hist 0 m File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx John d moved page File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx to File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx: Rename to include reticle barcode in filename current
- 11:47, 14 February 2022 diff hist 0 File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx John d uploaded a new version of File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx
- 13:49, 11 February 2022 diff hist +53 m ICP Etch 2 (Panasonic E626I) →Recipes Tag: Visual edit
- 13:48, 11 February 2022 diff hist +97 ICP Etch 1 (Panasonic E646V) separate process control section/link Tag: Visual edit
- 13:47, 11 February 2022 diff hist +59 ICP Etch 2 (Panasonic E626I) →Recipes: separate Process Control section/link Tag: Visual edit
- 13:24, 11 February 2022 diff hist +31 Test Data of etching SiO2 with CHF3/CF4 minor update to diamond experiemnt comment. Tag: Visual edit
- 13:23, 11 February 2022 diff hist -36 ICP Etching Recipes →ICP Etch 2 (Panasonic E640): updated ICP1 and ICP2 with Process Control sections for SiO2 etch tests. Tag: Visual edit
- 13:22, 11 February 2022 diff hist +252 N MediaWiki:Deletereason-dropdown added common NanoFab reasons for deletion current
- 13:19, 11 February 2022 diff hist +504 Test Data of etching SiO2 with CHF3/CF4-ICP1 new section :pasted data from CHF3/CF4/O2 etch data
- 13:13, 11 February 2022 diff hist +22 ICP Etching Recipes →SiO2 Etch Historical Data: reanmed to include tool name Tag: Visual edit
- 13:12, 11 February 2022 diff hist -37 ICP Etching Recipes →SiO2 Etching (Fluorine ICP Etcher): consolidated FL-ICP Prcoess Control data Tag: Visual edit
- 13:11, 11 February 2022 diff hist +493 Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher pasted Ning's 2nd data table, hilighted recipe changes and comment about data being "in progress"
- 12:28, 11 February 2022 diff hist +1 ICP Etching Recipes →PlasmaTherm/SLR Fluorine Etcher: moved historical data to top Tag: Visual edit
- 12:46, 4 February 2022 diff hist +260 Template:Announcements ASML maintenance
- 15:24, 1 February 2022 diff hist +3 m Autostep 200 Mask Making Guidance →Mask Layout Tag: Visual edit
- 15:23, 1 February 2022 diff hist +119 m Autostep 200 Mask Making Guidance →Photomask Ordering Info Tag: Visual edit
- 10:00, 1 February 2022 diff hist +327 Autostep 200 Mask Making Guidance →Photomask Ordering Info: added info Tag: Visual edit
- 09:39, 1 February 2022 diff hist +428 Autostep 200 Mask Making Guidance →Alignment Marks: adde Vernier CAD file Tag: Visual edit
- 09:37, 1 February 2022 diff hist +110 N File:Vernier Template.gds Vernier Registration/Alignment Test structure for lithography. Designed by Demis D. John, 2008.
- 09:03, 1 February 2022 diff hist -14 m Stepper 2 (AutoStep 200) →Process Information Tag: Visual edit
- 17:30, 31 January 2022 diff hist +185 Autostep 200 Mask Making Guidance →Mask Layout: 2nd attempt to describe Shutter positioning Tag: Visual edit
- 17:19, 31 January 2022 diff hist +352 Autostep 200 Mask Making Guidance →Mask Layout: 1st attempt at describing shutter blades Tag: Visual edit
- 17:00, 31 January 2022 diff hist +172 Autostep 200 Mask Making Guidance →Mask Layout / Alignment Marks: split into Mask layout separate section Tag: Visual edit
- 16:55, 31 January 2022 diff hist +30 Autostep 200 Troubleshooting and Recovery →What to do if you cannot undo the problem or need some help: link to each contact, update to use "Report tool issue' button on SUM current Tag: Visual edit
- 17:09, 28 January 2022 diff hist +358 m Oxford ICP Etcher - Process Control Data →Data - InP Ridge Etch (Oxford ICP Etcher) Tag: Visual edit
- 17:06, 28 January 2022 diff hist +805 Oxford ICP Etcher - Process Control Data updated tables, split into "sample size dpeendence" table Tag: Visual edit
- 21:43, 27 January 2022 diff hist +356 MLA150 - Troubleshooting →Solutions for small substrates: added THomas Messner's solution: disable Overview Camera before starting exposure Tag: Visual edit