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* Job to copy: '''TEST''' * From? '''[10,61]TEST.*'''

#Job to copy: '''TEST''' #From? '''[10,61]TEST.*'''

# Job to copy: '''TEST''' # From? '''[10,61]TEST.*'''

==== Test run on "dummy wafer" ==== ** Load cleaning recipe "Post dep PD", t=900sec

*** Chamber season on a clean test wafer * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''

::::'''''SiO 1/4λ time''': t_1/4λ = 259.4nm ÷ 5.2nm/min = 49.88min = '''2993.077 sec''''' ...sub>1/4λ</sub> * λ_target / λ_measured = ''corrected'' t_1/4λ

...ent markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Opti ===Resolution Test Charts===

|type = Inspection, Test and Characterization ...probes are provided. The measurements can be taken with various electronic test equipment detailed below, including HP multimeters, a Tektronix Curve-Trace

**Battery Test<br /> ''Old pages we don't use on the Wiki anymore, but are kept for possible utility later on.''

|type = Inspection, Test and Characterization ...considered a "reasonable" fit because the curves are very similar, but don't overlay perfectly, giving only reasonable confidence in the reported number

|type = Inspection, Test and Characterization ...aves literally hundreds of hours over non-infrared techniques and it doesn't damage or affect the part in any way.

UPDATE: doesn’t work: Ning tried this and found these patterns were too difficult to see on *** ''More info on either pattern can be [[ASML Stepper 3 - UCSB Test Reticles|found here]].''

...the info from this screen (for example if you closed it already or it didn't show useful info), you can find the root-cause in the Error Log window. #'''Main Menu > Test Manager > Run Tests > Metrology Verification > Image Quality Control'''

...lines must be manually switched between the two options shown (gasses can't be used simultaneously): N₂/He, CHF₃/Ar and CF<sub>4< **''Historical Data'' records "calibration" etches to test tool performance.

...ern "Visual Editor". Due to existing page linking/URLs, many of these can't be changed (such as code used for superscripts and subscripts in page names Only Staff & Admins can make new pages. If you want to do this but don’t have permission, please let the [[Wiki Admin|wiki admin]] know and we’ll

...ice users. Charge for All wafers, including test/dummy wafers that we don't send to the user. Discuss any possible exceptions as needed.

...apes and line-types (Line/polyline/LWLine for example) used in AutoCAD don't convert as expected into the polygons needed for printing. Also the DXF fi *[[Resolution Test structures]] - '''''To Be Added'''''

**If you need to pattern all the way to the edge of the wafer, PR won't work because you have to remove the edge-bead of photoresist (see above). ...make sure to excess-fill enough and cover tightly with tinfoil so it doesn't dry up), complete with ACE/ISO rinse

...he die center at the wafer plane is entered for X and Y. You should run a test sample to determine how well the DFAS system is performing for your mask se Don’t forget to save the changes. If you just wanted to look at the program you