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There are two standard recipes for SiN and SiO2 deposition at 250C in PECVD#1. Instructions bellow === Standard Si3N4 (Silicon-Nitride) Deposition ===

There are three standard recipes : STD SiO2, STD Nitride2, and STD LS Nitride2 at 300C. Instructions === Standard Oxide Deposition ===

*[[ media: NewPECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] *[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Recipe]]

b) Edit standard recipes (for seasoning, deposition, and cleaning). You can '''ONLY''' chang * Seasoning recipe name:

c) Edit '''standard recipes''' (for seasoning, deposition, and cleaning). You can '''ONLY chang * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''

Scan the wafers using the standard recipes: '''"UCSB Gain4''' (measuring small particles 0.16-1.6um ), and " ' * Load/Edit/Verify standard recipes (for seasoning, deposition, and cleaning). You can change ONLY the

...of Dec. 2019), users may '''only edit <u>Deposition Time</u>''', no other recipe modifications or customizations are permitted without staff approval. c) Edit '''standard recipes''' (for seasoning, deposition, and cleaning). You can '''ONLY chang

...E_917R6jF_K-btCHjsiIM/edit#gid= SiO₂<nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si₃N₄<nowiki> [PECVD 1] Standard Recipe</nowiki>]

* SiO₂ [PECVD 1] Standard Recipe * Si₃N₄ [PECVD 1] Standard Recipe

...t0ovP0MtpFtICjpH0-prs/edit#gid= SiO₂<nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si₃N₄<nowiki> [PECVD 1] Standard Recipe</nowiki>]

...ts/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si3N4 Standard Recipe] ...ets/d/1uqpg3sirsRbXdTFlxZ6_k3t0ovP0MtpFtICjpH0-prs/edit#gid= SiO2 Standard Recipe]

.../wiki/images/1/15/Fe_and_Co_Films_using_Sputter-3.pdf Fe and Co Deposition Recipe] ...notech.ucsb.edu/wiki/images/5/5e/Cu_Film_using_Sputter-3.pdf Cu Deposition Recipe]

*'''Temperature''': Standard operating temperature is 300C, but can be user changed for temps ranging an **The Low-Stress Si3N4 film recipe are tested approx. monthly, and kept within ±100MPa. Data can be found at

|Normal "Cauchy on Silicon" recipe |Measure with "Standard" setting

# Click '''[Baseline…]''', set to "'''Si'''" and '''[Take Reflectance Standard]''' & '''[Next-->]''' ...ipe from the Dropdown list (ok to ''discard changes''), and Click '''[Edit Recipe…]''' to set the layers to approximately what you expect to measure.

...recipe into a different name when the edit is done by clicking the '''Save Recipe as Different Filename''' icon at the top-left corner). ...ition as the origin for the map. This position is not saved as part of the recipe; B) '''Absolute-'''set a specific (x, y) location as the origin of the map.

...tch_Bosch_DSEIII.pdf Bosch Process Recipe and Characterization] - Standard recipe on the tool. **Recipe Name: "'''''Plasma-Therm Standard DSE'''''" (''Production'' - copy to your ''Personal'' category)

#*[[#Photolithography_Recipes |'''Photo Lithography Recipe section''']] ...ll>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small>