Search results

Page title matches

• STD SiO2 recipe
  72 bytes (13 words) - 11:00, 21 April 2020
• Unaxis Test Recipe Page
  208 bytes (6 words) - 15:19, 20 April 2018
• YES Recipe Screenshots: STD-O2
  669 bytes (132 words) - 12:12, 30 November 2023
• YES Recipe Screenshots: STD-N2-O2
  |[[File:STD-N2-O2-180C-3KW-1min - steps.jpg|alt=screenshot of recipe STD-N2-O2-180C-3KW-1min - steps|none|thumb|STD-N2-O2-180C-3KW-1min - steps]
  725 bytes (147 words) - 12:08, 30 November 2023
• PECVD1-SIN Standard Recipe (PlasmaTherm 790)
  ...uBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing PECVD1-SiN Standard Recipe Spreadsheet]
  174 bytes (20 words) - 15:37, 18 March 2014
• ADT 7100 - Recovering an Old Recipe (2019)
  # Go to any recipe # Click 'Recipe Import'[[File:Recipe import.png]]
  487 bytes (77 words) - 03:15, 27 March 2019
• Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe.
  223 bytes (40 words) - 16:22, 9 June 2023
• Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)
  707 bytes (100 words) - 18:26, 6 April 2020

Page text matches

• Other Dry Etching Recipes
  ...tps://wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe] ...ch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO₂ Etch Recipe 1]
  1 KB (178 words) - 08:17, 9 December 2022
• ADT 7100 - Recovering an Old Recipe (2019)
  # Go to any recipe # Click 'Recipe Import'[[File:Recipe import.png]]
  487 bytes (77 words) - 03:15, 27 March 2019
• PECVD1 Recipes
  *[[ media: NewPECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] *[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Recipe]]
  2 KB (250 words) - 16:22, 8 January 2015
• PECV1 Wafer Coating Process Traveler
  [[Table SiO2 recipe]]
  21 bytes (3 words) - 16:00, 30 March 2020
• PECVD1-SiN standard recipe.pdf
  ...//drive.google.com/?tab=mo&authuser=0#my-drive=sharing PECVD1-SIN Standard Recipe]
  90 bytes (13 words) - 15:21, 18 March 2014
• PECVD1 Wafer Coating Process Traveler
  * Seasoning recipe name: * Deposition recipe name:
  2 KB (325 words) - 16:38, 30 March 2020
• PECVD1-SIN Standard Recipe (PlasmaTherm 790)
  ...uBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing PECVD1-SiN Standard Recipe Spreadsheet]
  174 bytes (20 words) - 15:37, 18 March 2014
• PECVD1 Wafer Coating Process
  #* Load the seasoning recipe (SiN seasoning), and run it. The goal of this step is to coat chamber walls #* Load the deposition recipe (SiN@250C), and run it. Deposition time is variable. Get the rate from [htt
  2 KB (270 words) - 13:16, 10 December 2020
• OLD - PECVD2 Recipes
  *[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]] *[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
  1 KB (189 words) - 12:28, 3 March 2022
• Wafer Coating Process Traveler
  #*Load the seasoning recipe (STD SiO2), and run it. The goal of this step is to coat oxide on chamber w #*Load the deposition recipe (STD SiO2), and run it. Deposition time is variable. Get the rate from [htt
  3 KB (416 words) - 16:54, 22 April 2020
• RIE Etching Recipes
  *[//wiki.nanotech.ucsb.edu/w/images/b/b4/ZnS_Plasma_Etch-1.pdf ZnS Etch Recipe - CH₄-H₂-Ar] ....edu/w/images/2/2f/SiO2-Etch-Recipe-using-RIE-3-a.pdf SiO₂ Etch Recipe with a very low surface damage - CHF<sub>3]
  2 KB (253 words) - 10:02, 14 June 2021
• Wafer Coating Process Traveler1
  * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min''' * Deposition recipe name: '''SiO2 LDR 250°C, t=780 sec'''
  4 KB (711 words) - 13:32, 30 March 2020
• RIE5 - Standard Operating procedure (Cortex Software)
  # Choose a recipe to run from the '''Recipe''' menu list. # Choose a recipe to run from the list of available recipes.
  2 KB (377 words) - 14:09, 17 October 2018
• PECVD Recipes
  ...E_917R6jF_K-btCHjsiIM/edit#gid= SiO₂<nowiki> [PECVD 1] Standard Recipe</nowiki>] ...VYcMxHRKE/edit#gid= Si₃N₄<nowiki> [PECVD 1] Standard Recipe</nowiki>]
  14 KB (2,130 words) - 10:28, 20 December 2023
• Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond
  * Set up POLOS recipe * Run recipe:
  823 bytes (131 words) - 08:12, 11 August 2020
• CDE ResMap Quick-Start instructions
  ...as location - 800px annot quarterwf.png|none|thumb|200x200px|Quarter Wafer recipe measurement location]] # Select Operator > Run Recipe
  1 KB (214 words) - 13:01, 17 April 2018
• Unaxis wafer coating procedure
  ...of Dec. 2019), users may '''only edit <u>Deposition Time</u>''', no other recipe modifications or customizations are permitted without staff approval. * Seasoning recipe name: '''SiO2 seasoning''', '''t=2min'''
  5 KB (801 words) - 21:29, 12 August 2020
• Atomic Layer Deposition Recipes
  ...ction. This Ozone-generator must be manually turned on before running the recipe - check with [[Atomic Layer Deposition (Oxford FlexAL)|supervisor]] for det For some recipes such as TiN, there are two loops in the recipe. The outermost loop controls the total thickness of the film, the inner lo
  7 KB (1,104 words) - 10:27, 15 June 2023
• Wafer Scanning process Traveler
  ...BTEST1 (for scanning 8” wafers) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gai
  2 KB (339 words) - 11:31, 22 April 2020
• Wafer Scanning/Coating Process Traveler ( combined/less detailed)
  * Example of how to run process for the standard recipe "SiO2 LDR 250°C" ** Load seasoning recipe " SiO2 seasoning" , time=2min
  3 KB (515 words) - 13:41, 20 April 2020

View (previous 20 | next 20) (20 | 50 | 100 | 250 | 500)