Difference between revisions of "Vacuum Deposition Recipes"

Revision as of 10:20, 6 September 2012

Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering					Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Ion Beam Deposition (IBD)	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Ion Beam Deposition (Tool)	Molecular Vapor Deposition (Tool)
Ag
Al
Al₂O₃
AlN
Au
B
Co
Cr
Cu
Fe
Ge
Hf
HfO₂
In
Ir
ITO
Mo
Nb
Ni
Pd
Pt
Ru
Si
SiN												R	R	R		R
SiO₂												R	R	R	R	R
SiO_xN_y
Sn
SrF₂
Ta
Ta₂O₅															R	R
Ti
TiN
TiO₂															R	R
V
W
Zn
ZnO₂
Zr
ZrO₂
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Ion Beam Deposition (Tool)	Molecular Vapor Deposition (Tool)

@@ Line 483: / Line 483: @@
 | {{rl|PECVD Recipes|SiN deposition (PECVD #2)}}
 | {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
+|
-| {{rl|ALD Recipes|SiO2 deposition (ALD)}}
 | {{rl|IBD Recipes|SiO2 deposition (IBD)}}
 |