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- 13:43, 13 November 2020 (diff | hist) . . (+3,288) . . N MLA Recipes (MLa recipes- Bilja trying to link R to recipes) (current) (Tag: Visual edit)
- 13:21, 13 November 2020 (diff | hist) . . (+270) . . Lithography Recipes (→Photolithography Recipes)
- 13:16, 13 November 2020 (diff | hist) . . (+40) . . Lithography Recipes (→Photolithography Recipes)
- 13:15, 13 November 2020 (diff | hist) . . (+40) . . Lithography Recipes (→Photolithography Recipes)
- 15:29, 3 November 2020 (diff | hist) . . (-120) . . PECVD Recipes (→Low-Stress SiN deposition (PECVD #2)) (current)
- 15:28, 3 November 2020 (diff | hist) . . (-127) . . PECVD Recipes (→SiN deposition (PECVD #2))
- 15:28, 3 November 2020 (diff | hist) . . (-112) . . PECVD Recipes (→SiO2 deposition (PECVD #2))
- 11:32, 16 October 2020 (diff | hist) . . (+150) . . Stepper Recipes
- 20:28, 13 October 2020 (diff | hist) . . (-2) . . PECVD Recipes (→SiO2 deposition (PECVD #1))
- 20:28, 13 October 2020 (diff | hist) . . (+118) . . PECVD Recipes (→SiN deposition (PECVD #1))
- 08:38, 13 October 2020 (diff | hist) . . (-228) . . PECVD Recipes
- 08:14, 13 October 2020 (diff | hist) . . (-1) . . PECVD Recipes (→Historical Particulate Data)
- 08:13, 13 October 2020 (diff | hist) . . (+1) . . PECVD Recipes (→PECVD 1 (PlasmaTherm 790))
- 08:13, 13 October 2020 (diff | hist) . . (-109) . . PECVD Recipes (→SiN deposition (PECVD #1))
- 15:38, 9 October 2020 (diff | hist) . . (-10) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 15:37, 9 October 2020 (diff | hist) . . (+64) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 15:16, 9 October 2020 (diff | hist) . . (+45) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 15:14, 9 October 2020 (diff | hist) . . (+10) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 15:12, 9 October 2020 (diff | hist) . . (+7) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 14:42, 9 October 2020 (diff | hist) . . (0) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 14:34, 9 October 2020 (diff | hist) . . (0) . . Direct-Write Lithography Recipes (→Negative Resist (MLA150))
- 14:33, 9 October 2020 (diff | hist) . . (+22) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 14:01, 9 October 2020 (diff | hist) . . (-1) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 13:58, 9 October 2020 (diff | hist) . . (+1) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 13:56, 9 October 2020 (diff | hist) . . (+4) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 13:52, 9 October 2020 (diff | hist) . . (+3) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 13:12, 9 October 2020 (diff | hist) . . (+19) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 10:41, 9 October 2020 (diff | hist) . . (+3) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 10:39, 9 October 2020 (diff | hist) . . (-2) . . Direct-Write Lithography Recipes (→Maskless Aligner (Heidelberg MLA150))
- 10:38, 9 October 2020 (diff | hist) . . (+55) . . Direct-Write Lithography Recipes (→Positive Resist (MLA150))
- 19:53, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→Uniformity Data)
- 19:52, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→Uniformity Data)
- 19:49, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→Uniformity Data)
- 19:47, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→Uniformity Data)
- 19:46, 14 July 2020 (diff | hist) . . (-124) . . PECVD Recipes (→SiN deposition (PECVD #2))
- 19:45, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→Thin-Film Properties)
- 19:43, 14 July 2020 (diff | hist) . . (+126) . . PECVD Recipes (→Thin-Film Properties)
- 19:41, 14 July 2020 (diff | hist) . . (0) . . PECVD Recipes (→SiO2 deposition (PECVD #2))
- 19:40, 14 July 2020 (diff | hist) . . (+1) . . PECVD Recipes (→PECVD 2 (Advanced Vacuum))
- 11:03, 2 July 2020 (diff | hist) . . (-8) . . Unaxis wafer coating procedure (→a) Prepare wafers:) (Tag: Visual edit)
- 11:02, 2 July 2020 (diff | hist) . . (-20) . . Unaxis wafer coating procedure (→1. Unaxis deposition - 300nm of SiO2 LDR film @250°C) (Tag: Visual edit)
- 11:01, 2 July 2020 (diff | hist) . . (+29) . . Unaxis wafer coating procedure (Tag: Visual edit)
- 11:01, 2 July 2020 (diff | hist) . . (+7) . . Unaxis wafer coating procedure (Tag: Visual edit)
- 11:00, 2 July 2020 (diff | hist) . . (+4,199) . . N Unaxis wafer coating procedure (Created page with "'''1. Unaxis deposition - 300nm of SiO2 LDR film @250°C''' a) Prepare wafers: · Regular 4 " Si wafer ~500nm think for seasoning · Your substrate for d...") (Tag: Visual edit)
- 10:47, 2 July 2020 (diff | hist) . . (-58) . . ICP-PECVD (Unaxis VLR) (Tag: Visual edit)
- 10:44, 2 July 2020 (diff | hist) . . (+65) . . ICP-PECVD (Unaxis VLR) (→Documentation) (Tag: Visual edit)
- 10:42, 2 July 2020 (diff | hist) . . (+68) . . N Wafer coating procedure (Created page with "[https://wiki.nanotech.ucsb.edu/wiki/File:Unaxis_SOP_3-30-2020.docx]") (current) (Tag: Visual edit)
- 10:41, 2 July 2020 (diff | hist) . . (+4) . . ICP-PECVD (Unaxis VLR) (→Documentation: wafer coating procedure correction) (Tag: Visual edit)
- 10:37, 2 July 2020 (diff | hist) . . (-76) . . ICP-PECVD (Unaxis VLR) (→Documentation) (Tag: Visual edit)
- 10:36, 2 July 2020 (diff | hist) . . (+65) . . ICP-PECVD (Unaxis VLR) (→Documentation) (Tag: Visual edit)
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