Difference between revisions of "Tony Bosch"
Jump to navigation
Jump to search
(→Tools) |
(→Tools) |
||
(One intermediate revision by the same user not shown) | |||
Line 22: | Line 22: | ||
*[[Vacuum Oven (YES)]] |
*[[Vacuum Oven (YES)]] |
||
*[[Sputter 3 (AJA ATC 2000-F)]] |
*[[Sputter 3 (AJA ATC 2000-F)]] |
||
+ | *[[Sputter 4 (AJA ATC 2200-V)]] |
||
+ | *[[Sputter 5 (AJA ATC 2200-V)]] |
||
*[[ICP-PECVD (Unaxis VLR)]] |
*[[ICP-PECVD (Unaxis VLR)]] |
||
*[[ICP-Etch (Unaxis VLR)]] |
*[[ICP-Etch (Unaxis VLR)]] |
||
− | *[[UV Ozone Reactor]] |
||
*[[Gold Plating Bench]] |
*[[Gold Plating Bench]] |
||
*[[ICP Etch 2 (Panasonic E640)]] |
*[[ICP Etch 2 (Panasonic E640)]] |
||
Line 34: | Line 35: | ||
*[[Probe Station & Curve Tracer]] |
*[[Probe Station & Curve Tracer]] |
||
*[[Optical Film Thickness (Filmetrics)]] |
*[[Optical Film Thickness (Filmetrics)]] |
||
− | *[[SEM Sample Coater (Hummer)]] |
||
*[[Resistivity Mapper (CDE RESMAP)]] |
*[[Resistivity Mapper (CDE RESMAP)]] |
||
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]] |
Revision as of 09:55, 20 April 2020
|
About
.
.
.
Tools
Tony Bosch is the supervisor for the following tools.