Information for "Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer)"
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Basic information
| Display title | Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) |
| Default sort key | Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) |
| Page length (in bytes) | 707 |
| Page ID | 63375 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Ningcao (talk | contribs) |
| Date of page creation | 08:25, 9 October 2018 |
| Latest editor | Jcrode (talk | contribs) |
| Date of latest edit | 18:26, 6 April 2020 |
| Total number of edits | 16 |
| Total number of distinct authors | 3 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |