Difference between revisions of "Template:Announcements"
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<!------------- Announcements ----------------> |
<!------------- Announcements ----------------> |
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| − | ===== IBD Up ===== |
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| − | System up. |
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| − | // [[User:John d|John d]] 12:27, 6 September 2018 (PDT) |
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===== Deep-UV uScope Operational ===== |
===== Deep-UV uScope Operational ===== |
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// [[User:John d|John d]] 23:49, 30 August 2018 (PDT) |
// [[User:John d|John d]] 23:49, 30 August 2018 (PDT) |
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| − | ===== GCA |
+ | ===== GCA Stepper Maintenance ===== |
| − | The GCA 6300 will be down 09/12/18 thru 09/13/18 from 8:00 am until 6:30 pm both days for service. |
+ | The GCA 6300 will be down 09/12/18 thru 09/13/18 from 8:00 am until 6:30 pm both days for service. |
| + | The GCA Autostep will be down from 09/10/18 thru 09/11/2018 from 8:00 am to 6:30 pm both days for service. |
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| + | The systems will be available for your use both days after 6:30 pm. Please schedule your process accordingly. |
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// [[User:John d|John d]] 15:19, 29 August 2018 (PDT) |
// [[User:John d|John d]] 15:19, 29 August 2018 (PDT) |
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Revision as of 23:01, 10 September 2018
UCSB NanoFab Announcements
Deep-UV uScope Operational
The DUV Microscope is now repaired and operational. // John d 23:49, 30 August 2018 (PDT)
GCA Stepper Maintenance
The GCA 6300 will be down 09/12/18 thru 09/13/18 from 8:00 am until 6:30 pm both days for service. The GCA Autostep will be down from 09/10/18 thru 09/11/2018 from 8:00 am to 6:30 pm both days for service. The systems will be available for your use both days after 6:30 pm. Please schedule your process accordingly. // John d 15:19, 29 August 2018 (PDT)
PECVD#1: Software Upgrade
Plasmatherm will be upgrading the system software on September 17th. The upgrade will take 3-5 days. After the upgrade is complete, everyone must be re-certified to use the tool. Please document any custom recipes that you may have, in case they can't be copied over. // John d 06:38, 15 August 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)