Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"

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==About==
 
==About==
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
+
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
  +
  +
It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
  +
  +
4-inch wafers are the most standard size to measure.
  +
  +
For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.
   
 
==Documentation==
 
==Documentation==
   
  +
===Operating Procedures===
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
 
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
 
**''For detailed measurement info, it is highly recommended that you read the manual.''
 
*[[Wafer scanning process traveler]]
 
*[[Glossary]]
 
*[[Errors]]
 
   
==Standard Recipes==
 
   
  +
*[https://wiki.nanofab.ucsb.edu/w/images/a/a2/SURFSCAN_6200_122123_for_8inch_wafers.pdf Surfscan 6200 8inch wafers] *
*[https://drive.google.com/drive/u/0/folders/135jBoHKLJ0uoLyD6NlHt_pgco8NJjdCs Standard Recipes]
 
  +
*[https://wiki.nanofab.ucsb.edu/w/images/1/1a/SURFSCAN_6200_122023_for_6inch_wafers.pdf Surfscan 6200 6inch wafers] *
  +
*[https://wiki.nanofab.ucsb.edu/w/images/9/9f/SURFSCAN_6200_122123_for_4inch_wafers.pdf Surfscan 6200 4inch wafers] *
  +
*[https://wiki.nanofab.ucsb.edu/w/images/a/a7/SURFSCAN_6200_122123_small_substrates.pdf Surfscan 6200 [Small samples, and 2inch and 3inch wafers]] *
  +
  +
**''You must water-mount your small sample or wafer(2inch or 3 inch) to a 4-inch wafer.''
 
*[[Wafer scanning process traveler|Wafer Particle Count - Process Traveler]]
  +
  +
*[https://wiki.nanofab.ucsb.edu/w/images/2/29/Wafer_Particle_Count-Process_Traveler.pdf Wafer Scanning Instructions]
  +
**''This is the procedure Staff uses to calibrate particle counts on our deposition tools.''
  +
  +
===Other Documentation===
  +
 
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
 
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
 
**''For detailed measurement info, it is highly recommended that you read the manual.''
  +
 
*[[Glossary]]
  +
*[[Surfscan Errors and Workarounds|Common Errors & Workarounds]]
   
 
==Examples==
 
==Examples==
<br />
 
 
{| class="wikitable"
 
{| class="wikitable"
 
|+A low-particle 4-inch wafer example:
 
|+A low-particle 4-inch wafer example:

Latest revision as of 18:02, 2 February 2024

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Location Bay 5
Tool Type Inspection, Test and Characterization
Manufacturer Tencor
Description Surface Analysis
KLA/Tencor Surfscan

Primary Supervisor Biljana Stamenic
(805) 893-4002
biljana@ece.ucsb.edu

Secondary Supervisor

Don Freeborn


Recipes N/A


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.

It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.

4-inch wafers are the most standard size to measure.

For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.

Documentation

Operating Procedures

Other Documentation

  • Operations Manual
    • For detailed measurement info, it is highly recommended that you read the manual.

Examples

A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan - 230113A7 Gain4 high particles.jpg Surfscan 230113A7G2 after low particles.jpg