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Showing below up to 50 results in range #21 to #70.
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- (hist) Exposing a wafer piece [48 bytes]
- (hist) Surfscan6200 photos [59 bytes]
- (hist) Errors [59 bytes]
- (hist) AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx [60 bytes]
- (hist) Operating Instructions [61 bytes]
- (hist) PECVD1 Operating Instructions.pdf [68 bytes]
- (hist) Wafer coating procedure [68 bytes]
- (hist) STD SiO2 recipe [72 bytes]
- (hist) Test Page [88 bytes]
- (hist) ADT UV-Tape Table 1042R [89 bytes]
- (hist) PECVD1-SiN standard recipe.pdf [90 bytes]
- (hist) InP Etch Test Result in Details [90 bytes]
- (hist) InP etch result in details [94 bytes]
- (hist) GCA Old full training manual [98 bytes]
- (hist) ProcessGroup: Shipping Samples on Dicing Tape+Frame [113 bytes]
- (hist) SPR220-7 at 3kW various temperature without N2 gas [118 bytes]
- (hist) Old Training Manual [120 bytes]
- (hist) Autostep 200 Old training manual [120 bytes]
- (hist) TEST PAGE [126 bytes]
- (hist) Surfscan Errors and Workarounds [133 bytes]
- (hist) YES-SPR220-Various-Temps [135 bytes]
- (hist) Jack Whaley [144 bytes]
- (hist) Adam Abrahamsen [149 bytes]
- (hist) Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture. [149 bytes]
- (hist) Vacuum Sealer [172 bytes]
- (hist) PECVD1-SIN Standard Recipe (PlasmaTherm 790) [174 bytes]
- (hist) THz Physics Presentations [186 bytes]
- (hist) E-Beam Lithography Recipes [187 bytes]
- (hist) Unaxis Test Recipe Page [208 bytes]
- (hist) Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe. [223 bytes]
- (hist) Michael Barreraz [234 bytes]
- (hist) Tino Sy [235 bytes]
- (hist) Mike Day [241 bytes]
- (hist) Luis Zuzunaga [252 bytes]
- (hist) SiO2 Etching Test using CF4/CHF3 [259 bytes]
- (hist) Foong Fatt [260 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4-Florine [264 bytes]
- (hist) Dan Read [275 bytes]
- (hist) Peder Lenvik [289 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4/O2 [293 bytes]
- (hist) Ovens 1, 2 & 3 (Labline) [301 bytes]
- (hist) Mike Silva [309 bytes]
- (hist) Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher [322 bytes]
- (hist) Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher [322 bytes]
- (hist) Vraj Mehalana [332 bytes]
- (hist) Thermal Evaporator 2 [357 bytes]
- (hist) Nanofab-IT - Add Device to Network [360 bytes]
- (hist) Vacuum Oven (YES) [378 bytes]
- (hist) Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers [422 bytes]
- (hist) Critical Point Dryer [430 bytes]