Pages with the most revisions

Jump to navigation Jump to search

Showing below up to 36 results in range #301 to #336.

View (previous 250 | next 250) (20 | 50 | 100 | 250 | 500)

  1. RIE5 - Standard Operating procedure (Cortex Software)‏‎ (1 revision)
  2. Sputter 5‏‎ (1 revision)
  3. Flood Exposure Recipes‏‎ (1 revision)
  4. Ellipsometer (Woollam) - Measuring thin dielectrics with Native Oxide pre-measurement‏‎ (1 revision)
  5. Stepper 1 (GCA 6300) Available chucks‏‎ (1 revision)
  6. Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers‏‎ (1 revision)
  7. Hummer SEM Sample Coater - Techniques to reduce charging in SEMs‏‎ (1 revision)
  8. Equipment Group - Video Training Procedures‏‎ (1 revision)
  9. InP Etch test -details‏‎ (1 revision)
  10. TEST PAGE‏‎ (1 revision)
  11. YES Recipe Screenshots: STD-O2‏‎ (1 revision)
  12. Video Training - Introduction (Internal)‏‎ (1 revision)
  13. InP Etch Test-in details‏‎ (1 revision)
  14. AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx‏‎ (1 revision)
  15. Stepper 1 (GCA 6300) Substrate Thickness, Shim Thickness ans Target Thickness‏‎ (1 revision)
  16. Surfscan Errors and Workarounds‏‎ (1 revision)
  17. Photomask Ordering Procedure for UCSB Users‏‎ (1 revision)
  18. Stepper 2 (AutoStep 200) - Operating Procedure - Piece Parts‏‎ (1 revision)
  19. Operating Instructions‏‎ (1 revision)
  20. PECVD.docx‏‎ (1 revision)
  21. PECVD1 Operating Instructions.pdf‏‎ (1 revision)
  22. Older Publications‏‎ (1 revision)
  23. YES Recipe Screenshots: STD-N2-O2‏‎ (1 revision)
  24. Advanced PECVD Recipes‏‎ (1 revision)
  25. Wafer coating procedure‏‎ (1 revision)
  26. LegacyTable‏‎ (1 revision)
  27. Lab Rules backup‏‎ (1 revision)
  28. STD SiO2 recipe‏‎ (1 revision)
  29. Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture.‏‎ (1 revision)
  30. Wafer Cleaver Recipes (LSD-155LT)‏‎ (1 revision)
  31. UCSBTEST1Gain4.jpg‏‎ (1 revision)
  32. ASML Stepper 3 - Substrates smaller than 100mm/4-inch‏‎ (1 revision)
  33. AUTOSTEP 200-PIECES instruction 6-20-19.pptx‏‎ (1 revision)
  34. MA6 Backside Alignment - Allowed Mark Locations‏‎ (1 revision)
  35. UV Ozone Quick Start‏‎ (1 revision)
  36. Oxford Etcher - Sample Size Effect on Etch Rate‏‎ (1 revision)

View (previous 250 | next 250) (20 | 50 | 100 | 250 | 500)

Retrieved from "https://wiki.nanofab.ucsb.edu/wiki/Special:MostRevisions"