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16:36, 1 February 2019
IP161510.pdf
(
file
)
61 KB
1
18:27, 2 February 2021
FE210206.pdf
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file
)
62 KB
1
16:19, 1 February 2019
IP172905.pdf
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file
)
62 KB
1
10:42, 1 February 2019
IP190103.pdf
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file
)
62 KB
1
12:48, 31 January 2019
IP180606.pdf
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file
)
62 KB
1
13:15, 31 January 2019
IP180304.pdf
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file
)
63 KB
1
15:50, 1 February 2019
IP170302.pdf
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file
)
67 KB
1
12:55, 31 January 2019
IP180508.pdf
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file
)
67 KB
1
16:40, 6 March 2019
SiO2 Etch using ICP2 with O2-3-06-2019.pdf
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file
)
69 KB
1
15:17, 9 November 2021
SOFL0103.pdf
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file
)
70 KB
1
15:17, 8 March 2019
SiO2 Etch using ICP2 no O2-3-06-2019.pdf
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file
)
70 KB
1
19:24, 9 August 2021
I2210508.pdf
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file
)
72 KB
1
18:27, 22 July 2021
I2210308.pdf
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file
)
79 KB
1
16:10, 17 April 2014
29-UnaxisPM3-SiO2-SiH4-O2-He.pdf
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file
)
88 KB
1
12:39, 30 January 2014
IMG 2416 1.jpg
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file
)
93 KB
1
11:16, 27 September 2013
11-CZT etching-1.pdf
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file
)
110 KB
1
15:27, 29 June 2015
35-Low-stress SiNx at 250 C using Unaxis ICP deposition tool.pdf
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file
)
118 KB
1
16:11, 17 July 2017
SiNx Films by PECVD2.pdf
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file
)
125 KB
1
16:08, 11 September 2013
02-ICP-PECVD-a-Si Film-90C.pdf
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file
)
131 KB
1
16:42, 16 December 2015
46-Mo Film using Sputter3.pdf
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file
)
143 KB
1
15:09, 18 March 2014
27-SiNx Film (Bias=50W) Sidewall Coverage.pdf
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file
)
150 KB
1
11:18, 14 March 2018
Cu Film using Sputter-3.pdf
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file
)
153 KB
1
09:02, 7 October 2013
19-AlN-Sputtering-Film-Sputter-2.pdf
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file
)
157 KB
1
12:23, 5 November 2013
24-Ni and Ta Films using Sputter-3.pdf
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file
)
165 KB
1
11:39, 30 June 2015
37-Low-stress SiNx at 100 C using Unaxis ICP deposition tool.pdf
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file
)
169 KB
1
10:22, 28 October 2013
22-TiO2-Film-Sputter-2.pdf
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file
)
172 KB
1
17:54, 8 April 2021
Holography Process for 1D-lines and 2D-dots (ARC-11 & THMR-IP3600HP-D)-updated-4-8-2021.pdf
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file
)
226 KB
1
16:11, 2 October 2013
16-GaAs etch-ICP-2.pdf
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file
)
229 KB
1
10:02, 27 June 2017
Al-Sputter4-5mT-200W-30m.pdf
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file
)
229 KB
1
10:37, 10 October 2013
21-Au-Sputter-film-recipes-Sputter-2.pdf
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file
)
240 KB
1
16:15, 11 October 2018
Holography Process for 1D-lines and 2D-dots (ARC-11 & THMR-IP3600HP-D)-updated-8-13-2018-A.pdf
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file
)
243 KB
1
16:03, 11 September 2013
03-Amorphous-Si-PECVD-2.pdf
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file
)
248 KB
1
09:24, 29 July 2016
ITO Deposition-250C-Ebeam2-HCl-Wet-Etch.pdf
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file
)
259 KB
1
10:20, 31 January 2019
SiO2 Etch using ICP2 with O2.pdf
(
file
)
264 KB
2
09:19, 19 August 2016
Ti Sputtering Film using Sputter 3.pdf
(
file
)
276 KB
1
11:35, 2 August 2016
SiO2-Etch-Recipe-using-RIE-3-a.pdf
(
file
)
283 KB
1
15:06, 22 June 2015
THMR-iP3600 HP D 20140801 (B) GHS US.pdf
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file
)
292 KB
1
14:03, 18 March 2014
23-Tungsten Sputtering Film-Sputter-4-Ar.pdf
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file
)
310 KB
1
11:36, 17 September 2013
06-XeF2-etch-recipe.pdf
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file
)
312 KB
1
16:25, 11 May 2017
ITO film-200C-O2-35sccm-EBeam2.pdf
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file
)
312 KB
1
16:39, 16 February 2016
49-Photolithography of SU8-2015-a.pdf
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file
)
327 KB
1
11:06, 28 July 2016
Rapid Thermal Annealing on Room-temperature grown ITO.pdf
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file
)
336 KB
1
16:30, 16 February 2016
48-Photolithography of SU8-2010.pdf
(
file
)
360 KB
1
15:36, 31 July 2020
InP Etching result-CAIBE.pdf
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file
)
373 KB
1
12:54, 31 January 2019
IP180508.pptx
(
file
)
377 KB
1
08:58, 19 August 2016
Ni Sputtering Film using Sputter 3.pdf
(
file
)
383 KB
1
15:28, 18 March 2014
28-Very-low-pin-hole-density SiNx film at 300 C.pdf
(
file
)
410 KB
1
10:23, 31 January 2019
SiO2 Etch using ICP2-no O2.pdf
(
file
)
414 KB
2
08:51, 30 August 2016
Ni Sputtering Film using Sputter 3-a.pdf
(
file
)
436 KB
1
14:02, 2 July 2018
SiO2-Mask Etch Recipe for Unaxis Cl2 Etch.pdf
(
file
)
446 KB
1
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