Difference between revisions of "PECVD Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 41: Line 41:
  
 
=[[PECVD 2 (Advanced Vacuum)]]=
 
=[[PECVD 2 (Advanced Vacuum)]]=
*[https://docs.google.com/spreadsheets/d/1kj0SWxRpnPRoGld8k3sW-3yK1iPm3buTkvlJSN5YPV4/edit#gid=sharing Particulates (Gain4) in PECVD#2 2015 ]
+
*[https://docs.google.com/spreadsheets/d/1kj0SWxRpnPRoGld8k3sW-3yK1iPm3buTkvlJSN5YPV4/edit#gid=sharing Particulates (Gain4) in PECVD#2 2015]
 
*[https://docs.google.com/spreadsheets/d/1xpk9tJrE68NIJ_1yIym0xBxd4fnzHHBHdkhFehruO3E/edit#gid=sharing Particulates (Gain4) in PECVD#2 2016]
 
*[https://docs.google.com/spreadsheets/d/1xpk9tJrE68NIJ_1yIym0xBxd4fnzHHBHdkhFehruO3E/edit#gid=sharing Particulates (Gain4) in PECVD#2 2016]
*[https://docs.google.com/spreadsheets/d/1ICgt-fgTvNPbE_65x5jUsqy8JjHVv5WUvmE7g7VUbsI/edit#gid=sharing Particulates (Gain4) in PECVD#2 2017 ]
+
*[https://docs.google.com/spreadsheets/d/1ICgt-fgTvNPbE_65x5jUsqy8JjHVv5WUvmE7g7VUbsI/edit#gid=sharing Particulates (Gain4) in PECVD#2 2017]
 
*[https://docs.google.com/spreadsheets/d/1yPAPP24z3RcRRi-HqEp3GJN4JM8Ec8SFJwZ-OYGG2HU/edit#gid=sharing Particulates (Gain4 and Gain2) in PECVD#2 films 2017]
 
*[https://docs.google.com/spreadsheets/d/1yPAPP24z3RcRRi-HqEp3GJN4JM8Ec8SFJwZ-OYGG2HU/edit#gid=sharing Particulates (Gain4 and Gain2) in PECVD#2 films 2017]
 
== SiO<sub>2</sub> deposition (PECVD #2)  ==
 
== SiO<sub>2</sub> deposition (PECVD #2)  ==
Line 87: Line 87:
 
==SiN deposition (Unaxis VLR) ==
 
==SiN deposition (Unaxis VLR) ==
 
=== SiN (2% SiH<sub>4</sub>)  ===
 
=== SiN (2% SiH<sub>4</sub>)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50° (pinholes)
+
! width="350" align="center" |50° (pinholes)
!width=350 align=center|100° (pinholes)
+
! width="350" align="center" |100° (pinholes)
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-5W-50C-High-Stress.pdf|SiN Deposition Recipe (5W 50° High Stress)]]  
 
*[[Media:PECVD2-SiN-Recipe-5W-50C-High-Stress.pdf|SiN Deposition Recipe (5W 50° High Stress)]]  
Line 118: Line 118:
  
 
=== SiN  (2% SiH<sub>4</sub> - No-Ar)  ===
 
=== SiN  (2% SiH<sub>4</sub> - No-Ar)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50° (pinholes)
+
! width="350" align="center" |50° (pinholes)
!width=350 align=center|100° (pinholes)
+
! width="350" align="center" |100° (pinholes)
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-NoAr-5W-50C-High-Stress.pdf|SiN Deposition Recipe - No Ar (5W 50° High Stress)]]
 
*[[Media:PECVD2-SiN-Recipe-NoAr-5W-50C-High-Stress.pdf|SiN Deposition Recipe - No Ar (5W 50° High Stress)]]
Line 149: Line 149:
  
 
=== SiN  (2% SiH<sub>4</sub> - No-Ar - Extra N<sub>2</sub>)  ===
 
=== SiN  (2% SiH<sub>4</sub> - No-Ar - Extra N<sub>2</sub>)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50° (pinholes)
+
! width="350" align="center" |50° (pinholes)
!width=350 align=center|100° (pinholes)
+
! width="350" align="center" |100° (pinholes)
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-50C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 50° Low Stress)]]
 
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-50C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 50° Low Stress)]]
Line 165: Line 165:
  
 
=== SiN  (100% SiH<sub>4</sub> ) ===
 
=== SiN  (100% SiH<sub>4</sub> ) ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50° (pinholes)
+
! width="350" align="center" |50° (pinholes)
!width=350 align=center|100° (pinholes)
+
! width="350" align="center" |100° (pinholes)
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (120W 50° Low Stress)]]
 
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (120W 50° Low Stress)]]
Line 178: Line 178:
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100% SiH4-120W-250C.pdf|SiN Deposition Recipe (120W 250° Low Stress)]]
 
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100% SiH4-120W-250C.pdf|SiN Deposition Recipe (120W 250° Low Stress)]]
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Comparison Table 120W, 100(250)C ]]
+
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Comparison Table 120W, 100(250)C]]
|- align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiN-Recipe-Medium stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (50W 50° Medium Stress)]]
 
*[[Media:PECVD2-SiN-Recipe-Medium stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (50W 50° Medium Stress)]]
Line 194: Line 194:
 
==SiO<sub>2</sub> deposition (Unaxis VLR) ==
 
==SiO<sub>2</sub> deposition (Unaxis VLR) ==
 
=== SiO<sub>2</sub> (2% SiH<sub>4</sub>)  ===
 
=== SiO<sub>2</sub> (2% SiH<sub>4</sub>)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50°
+
! width="350" align="center" |50°
!width=350 align=center|100°
+
! width="350" align="center" |100°
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiO2Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]]  
 
*[[Media:PECVD2-SiO2Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]]  
Line 213: Line 213:
  
 
=== SiO<sub>2</sub> (2% SiH<sub>4</sub> - No Ar)  ===
 
=== SiO<sub>2</sub> (2% SiH<sub>4</sub> - No Ar)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50°
+
! width="350" align="center" |50°
!width=350 align=center|100°
+
! width="350" align="center" |100°
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiO2-Recipe-NoAr-50C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (50°)]]  
 
*[[Media:PECVD2-SiO2-Recipe-NoAr-50C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (50°)]]  
Line 232: Line 232:
  
 
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> HDR)  ===
 
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> HDR)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50°
+
! width="350" align="center" |50°
!width=350 align=center|100°
+
! width="350" align="center" |100°
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:SiO2 100% SiH4 HDR 50C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (50°)]]  
 
*[[Media:SiO2 100% SiH4 HDR 50C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (50°)]]  
Line 250: Line 250:
  
 
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> LDR)  ===
 
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> LDR)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|50°
+
! width="350" align="center" |50°
!width=350 align=center|100°
+
! width="350" align="center" |100°
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-50C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (50°)]]  
 
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-50C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (50°)]]  
Line 269: Line 269:
  
 
=== Amorphous Si (100%SiH<sub>4</sub> Ar He)  ===
 
=== Amorphous Si (100%SiH<sub>4</sub> Ar He)  ===
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+
{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
 
|- bgcolor="#D0E7FF"
 
|- bgcolor="#D0E7FF"
!width=350 align=center|90°
+
! width="350" align="center" |90°
!width=350 align=center|250°
+
! width="350" align="center" |250°
|-align=left
+
|- align="left"
 
|
 
|
 
*[[Media:02-ICP-PECVD-a-Si_Film-90C.pdf|a-Si Deposition Recipe - 90°]]  
 
*[[Media:02-ICP-PECVD-a-Si_Film-90C.pdf|a-Si Deposition Recipe - 90°]]  

Revision as of 13:00, 26 September 2017

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO2 deposition (PECVD #1)

OTHER recipes: LS SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)

SiN deposition (PECVD #2)

LS SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH4)

50° (pinholes) 100° (pinholes) 250°

SiN (2% SiH4 - No-Ar)

50° (pinholes) 100° (pinholes) 250°

SiN (2% SiH4 - No-Ar - Extra N2)

50° (pinholes) 100° (pinholes) 250°

SiN (100% SiH4 )

50° (pinholes) 100° (pinholes) 250°

SiO2 deposition (Unaxis VLR)

SiO2 (2% SiH4)

50° 100° 250°

SiO2 (2% SiH4 - No Ar)

50° 100° 250°

SiO2 (100% SiH4 HDR)

50° 100° 250°

SiO2 (100% SiH4 LDR)

50° 100° 250°

Amorphous Si (100%SiH4 Ar He)

90° 250°