Difference between revisions of "Other Dry Etching Recipes"

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{{recipes|Dry Etching}}
 
{{recipes|Dry Etching}}
 
=[[XeF2 Etch (Xetch)]]=
 
=[[XeF2 Etch (Xetch)]]=
*[//wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe]
   
 
=[[Vapor HF Etch (uETCH)]]=
 
=[[Vapor HF Etch (uETCH)]]=
*[//wiki.nanotech.ucsb.edu/w/images/e/e2/25-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO<sub>2</sub> Etch Recipe 1]
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*[https://wiki.nanotech.ucsb.edu/w/images/e/e2/25-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO<sub>2</sub> Etch Recipe 1]
*[//wiki.nanotech.ucsb.edu/w/images/d/d4/26-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-b.pdf SiO<sub>2</sub> Etch Recipe 2]
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*[https://wiki.nanotech.ucsb.edu/w/images/d/d4/26-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-b.pdf SiO<sub>2</sub> Etch Recipe 2]
   
 
=[[CAIBE (Oxford Ion Mill)]]=
 
=[[CAIBE (Oxford Ion Mill)]]=
 
*'''Remind: From now on, one should always use Prf=200W! (see Brian Lingg for explanation)'''
 
*'''Remind: From now on, one should always use Prf=200W! (see Brian Lingg for explanation)'''
*[//wiki.nanotech.ucsb.edu/w/images/2/28/42-Etching_Platinum_using_Oxford_Ion_Mill_Tool-a.pdf Pt Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/2/28/42-Etching_Platinum_using_Oxford_Ion_Mill_Tool-a.pdf Pt Etch Recipe]
*[//wiki.nanotech.ucsb.edu/w/images/e/e3/44-Etching_Gold_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Au Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/e/e3/44-Etching_Gold_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Au Etch Recipe]
*[//wiki.nanotech.ucsb.edu/w/images/f/f1/45-Etching_Nickel_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Ni Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/f/f1/45-Etching_Nickel_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Ni Etch Recipe]
   
 
=Misc=
 
=Misc=

Revision as of 18:24, 4 April 2020