Maskless Aligner (Heidelberg MLA150)

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Maskless Aligner (Heidelberg MLA150)
Tool Type Lithography
Location Bay 6
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Maskless I-Line Photolithography
Manufacturer Heidelberg Instruments
Model MLA150
Materials I-Line Photoresists


About

The MLA150 allows for arbitrary direct patterning of I-Line photoresists, directly from a CAD drawing/file, and alignment to arbitrary features on the sample. The system uses a optical digital light process (MEMS light-field patterning) to programatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

Detailed Specifications

  • Wafer size:
  • Wafer / substrate thickness:
  • Exposure optics:
    • Laser #1:
    • Laser #2:
  • Focus modes:
  • Alignment:
    • Modes?
    • Accuracy:
    • Repetability
  • Additional manufacturer options (none installed on our systems):
    • Focus option?
    • Dual lasers?
    • High-resolution option?
  • Uniformity:
  • Write speeds:


Documentation

Design Tools/Info