MLA150 - CAD Files and Templates
Resolution and Calibration Patterns
Has line-space periodicity from XYZ to XYZ nm. Isolated versus dense is shown via certain lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.
- Single-Die - a single unit cell of the pattern, used for focus-exposure matrix (series)
- Image Size for the Unit-Cell
- Full Wafer - covers a 100mm wafer, used for alignment vernier testing.
Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:
|Camera||Field of View|
|Low Mag.||640 x 480 µm|
|High Mag.||190 x 140 µm|
For the best alignment, the High-Mag camera is preferred, so a Cross of ~250µm x 200µm (50µm larger than the high-mag. FOV), with line width of 20µm would be acceptable.
The coordinates to the center of each mark should be known, with respect to the origin (0,0) of the CAD file to be exposed.
Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for cleaved pieces without much unused edge area).