Difference between revisions of "Lithography Recipes"
Jump to navigation
Jump to search
(→Photolithography Recipes: linked to all PR datasheets) |
m ("A" on MLA --> SU-8 2075) |
||
Line 80: | Line 80: | ||
| |
| |
||
|-<!-- This is a White row color --> |
|-<!-- This is a White row color --> |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4210] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 88: | Line 88: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4330RS] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 96: | Line 96: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/a/a2/Az_p4620_photoresist_data_package.pdf AZ4620] |
| |
| |
||
| |
| |
||
Line 104: | Line 104: | ||
|A |
|A |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/8/8b/OCG825-Positive-Resist-Datasheet.pdf OCG 825-35CS] |
| A |
| A |
||
| A |
| A |
||
Line 120: | Line 120: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/2/29/SPR955-Positive-Resist-Datasheet.pdf SPR 955 CM-0.9] |
|A |
|A |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 128: | Line 128: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/2/29/SPR955-Positive-Resist-Datasheet.pdf SPR 955 CM-1.8] |
|A |
|A |
||
|A |
|A |
||
Line 136: | Line 136: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/3/3f/SPR220-Positive-Resist-Datasheet.pdf SPR 220-3.0] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 144: | Line 144: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/3/3f/SPR220-Positive-Resist-Datasheet.pdf SPR 220-7.0] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 152: | Line 152: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/b/be/3600_D%2C_D2v_Spin_Speed_Curve.pdf THMR-IP3600 HP D] |
| |
| |
||
| |
| |
||
Line 160: | Line 160: | ||
|A |
|A |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/3/38/UV6-Positive-Resist-Datasheet.pdf UV6-0.8] |
| |
| |
||
| |
| |
||
Line 168: | Line 168: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/ff/UV210-Positive-Resist-Datasheet.pdf UV210-0.3] |
| |
| |
||
| |
| |
||
Line 176: | Line 176: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/0/07/UV26-Positive-Resist-Datasheet.pdf UV26-2.5] |
| |
| |
||
| |
| |
||
Line 187: | Line 187: | ||
{{LithRecipe Table}} |
{{LithRecipe Table}} |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/b/b0/AZ5214-Negative-Resist-Datasheet.pdf AZ5214-EIR] |
|{{rl|Contact_Alignment_Recipes|Negative Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Negative Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
||
Line 195: | Line 195: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/5/5e/AZnLOF2020-Negative-Resist-Datasheet.pdf AZnLOF 2020] |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
||
Line 203: | Line 203: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/5/5e/AZnLOF2020-Negative-Resist-Datasheet.pdf AZnLOF 2035] |
| bgcolor="EEFFFF" |A |
| bgcolor="EEFFFF" |A |
||
| bgcolor="EEFFFF" |A |
| bgcolor="EEFFFF" |A |
||
Line 211: | Line 211: | ||
| bgcolor="EEFFFF" | |
| bgcolor="EEFFFF" | |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/5/5e/AZnLOF2020-Negative-Resist-Datasheet.pdf AZnLOF 2070] |
|A |
|A |
||
|A |
|A |
||
Line 219: | Line 219: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/8/82/AZnLOF5510-Negative-Resist-Datasheet.pdf AZnLOF 5510] |
|A |
|A |
||
|A |
|A |
||
Line 227: | Line 227: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/c/c9/UVN-30_-_Negative-Resist-Datasheet_-_Apr_2004.pdf UVN30-0.8] |
| |
| |
||
| |
| |
||
Line 235: | Line 235: | ||
| |
| |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/7/78/SU-8-2015-revA.pdf SU-8 2005,2010,2015] |
| A |
| A |
||
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
| {{rl|Contact_Alignment_Recipes|Negative Resist (MA-6)}} |
||
Line 243: | Line 243: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/2/2c/SU-8-2075-revA.pdf SU-8 2075] |
|A |
|A |
||
|A |
|A |
||
Line 249: | Line 249: | ||
|A |
|A |
||
| |
| |
||
− | | |
+ | |A |
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |NR9-[ |
+ | | bgcolor="#D0E7FF" align="center" |NR9-[//wiki.nanotech.ucsb.edu/w/images/8/8f/NR9-1000PY-revA.pdf 1000],[//wiki.nanotech.ucsb.edu/w/images/7/71/NR9-3000PY-revA.pdf 3000],[//wiki.nanotech.ucsb.edu/w/images/f/f9/NR9-6000PY-revA.pdf 6000]PY |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MJB-3)}} |
||
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
|{{rl|Contact_Alignment_Recipes|Positive Resist (MA-6)}} |
||
Line 262: | Line 262: | ||
{{LithRecipe Table}} |
{{LithRecipe Table}} |
||
|- |
|- |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/0/07/DUV42P-Anti-Reflective-Coating.pdf DUV42-P] |
| |
| |
||
| |
| |
||
Line 270: | Line 270: | ||
| |
| |
||
|- bgcolor="EEFFFF" |
|- bgcolor="EEFFFF" |
||
− | | bgcolor="#D0E7FF" align="center" |[ |
+ | | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/a/af/DS-K101-304-Anti-Reflective-Coating.pdf DS-K101-304] |
| |
| |
||
| |
| |
Revision as of 23:11, 27 September 2020
General Information
This page contains information and links to recipes/datasheets spin-coated materials used in the facility.
Table of Contents |
---|
Photolithography Processes
Photolithography Chemicals/Materials
|
Photolithography Recipes
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.
Photolithography Recipes
| ||||||
---|---|---|---|---|---|---|
Contact Aligner Recipes | Stepper Recipes | Other | ||||
Positive Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ4110 | R | R | A | A | ||
AZ4210 | R | R | A | A | ||
AZ4330RS | R | R | A | A | ||
AZ4620 | A | |||||
OCG 825-35CS | A | A | A | A | ||
SPR 950-0.8 | A | A | A | A | ||
SPR 955 CM-0.9 | A | R | R | R | ||
SPR 955 CM-1.8 | A | A | R | R | ||
SPR 220-3.0 | R | R | R | R | ||
SPR 220-7.0 | R | R | R | R | ||
THMR-IP3600 HP D | A | A | A | |||
UV6-0.8 | R | |||||
UV210-0.3 | R | |||||
UV26-2.5 | A | |||||
Negative Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
AZ5214-EIR | R | R | R | R | ||
AZnLOF 2020 | R | R | R | R | ||
AZnLOF 2035 | A | A | A | A | ||
AZnLOF 2070 | A | A | A | A | ||
AZnLOF 5510 | A | A | R | R | ||
UVN30-0.8 | R | |||||
SU-8 2005,2010,2015 | A | R | A | A | ||
SU-8 2075 | A | A | A | A | A | |
NR9-1000,3000,6000PY | R | R | A | R | ||
Anti-Reflection Coatings | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
DUV42-P | R | |||||
DS-K101-304 | R | |||||
SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) |
Lift-Off Recipes
- Lift-Off Description/Tutorial
- How it works, process limits and considerations for designing your process
- I-Line Lift-Off: Bi-Layer Process with PMGI Underlayer and Contact Aligner
- DUV Lift-Off: UV6 Imaging Resist + PMGI Underlayer
E-Beam Lithography Recipes (JEOL JBX-6300FS)
- Under Development.
FIB Lithography Recipes (Raith Velion)
To Be Added
Automated Coat/Develop System Recipes (S-Cubed Flexi)
Recipes pre-loaded on the S-Cubed Flexi automated coat/bake/develop system. Only staff may write new recipes, contact the tool supervisor for more info.
To Be Added
Nanoimprinting Recipes
- Thermal Nanoimprint Process and Tutorial
- UV-Cure Low Temp, Low Pressure, Soft-Stamp Nanoimprint Process
Holography Recipes
- Standard Holography Process - on SiO2 on Si
- Holography Process Variations - Set-up Angle - Etching into SiO2 and Si
- Etch SiO2 Nano-structure - Changing Side-wall Angle - Etching into Si with a different line-width
- Reduce SiO2 Nanowire Diameter - Thermal Oxidation - Vapor HF Etching
Low-K Spin-On Dielectric Recipes
Chemicals Stocked + Datasheets
The following is a list of the lithography chemicals we stock in the lab, with links to the datasheets for each. The datasheets will often have important processing info such as spin-speed vs. thickness curves, typical process parameters, bake temps/times etc.