Difference between revisions of "UV Ozone Reactor"

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(link to Quick start from TBosch email, and user manual PDF)
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|picture=Ozone.jpg
 
|picture=Ozone.jpg
 
|type = Dry Etch
 
|type = Dry Etch
|super= Tony Bosch
+
|super= Lee Sawyer
  +
|model=M-144AX
 
|location=Bay 5
 
|location=Bay 5
|description = ?
+
|description = UV Ozone Reactor
|manufacturer = ?
+
|manufacturer = Jelight
 
}}
 
}}
= About =
+
==About==
  +
The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment.
   
  +
==Documentation==
== Operating Procedures ==
 
  +
[[UV Ozone Quick Start|Quick Start]]
 
[[Media:UV Ozone Manual Jelight M-144AX.pdf]]
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*[[UV Ozone Quick Start|Quick Start]]
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*[//www.nanotech.ucsb.edu/wiki/images/7/79/UV_Ozone_Manual_Jelight_M-144AX.pdf UV Ozone Manual]

Latest revision as of 14:33, 11 September 2019

UV Ozone Reactor
Ozone.jpg
Tool Type Dry Etch
Location Bay 5
Supervisor Lee Sawyer
Supervisor Phone (805) 893-2123
Supervisor E-Mail lee_sawyer@ucsb.edu
Description UV Ozone Reactor
Manufacturer Jelight
Model M-144AX
Dry Etch Recipes


About

The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment.

Documentation