Difference between revisions of "Automated Coat/Develop System (S-Cubed Flexi)"

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(added PR's and links to recipes)
(added notice abotu staff use only)
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'''This tool is only available for Staff use at this time.'''
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=About=
 
=About=
   
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*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])
 
*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])
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*See the [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.
   
 
=Operating Procedures=
 
=Operating Procedures=

Revision as of 15:03, 8 October 2019

Automated Coat/Develop System (S-Cubed Flexi)
Tool Type Lithography
Location Bay 7
Supervisor Tony Bosch
Supervisor Phone (805) 893-3486
Supervisor E-Mail bosch@ece.ucsb.edu
Description Automatic Coat/Bake/Develop
Manufacturer S-Cubed
Lithography Recipes


This tool is only available for Staff use at this time.

About

To Be Added

Detailed Specifications

  • Wafer Size: 100mm (150mm possible but not set up)
  • PR Coating Properties:
    • Uniformity < 1.0%
    • < 100 particles on 100mm wafer
  • Photoresists/Underlayers Available:
    • UV6-0.8
    • DS-K101-304
    • PMMA
    • PMGI SF11
    • PMGI SF5
  • Solvents Available:
    • EBR100
  • Developers Available:
    • AZ 300 MiF

Process Information

Operating Procedures

  • To Be Added