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  • ICP-PECVD (Unaxis VLR)
    |phone=(805)839-3918x217 |manufacturer = Unaxis
    3 KB (454 words) - 10:35, 23 May 2023
  • PECVD Recipes
    *[https://docs.google.com/spreadsheets/d/1wloq6HJw5RQIvmeKcBn3xvE_917R6jF_K-btCHjsiIM/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowik *[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiO2_deposition_.28PECVD_.231.29 SiO<sub>2</sub><nowiki> [PECVD 1] Histor
    14 KB (2,130 words) - 10:28, 20 December 2023
  • Old Deposition Data - NastaziaM 2021-11-22
    ...03619544 SiO<sub>2</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - 2021-10 and earlier ...sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - 2021-10 and earlier
    36 KB (5,386 words) - 09:31, 14 December 2021
  • Deposition Data - temporary 2021-12-15
    '''NEW data templates - Demis 2021-12-15''' ...s://docs.google.com/spreadsheets/d/1uqpg3sirsRbXdTFlxZ6_k3t0ovP0MtpFtICjpH0-prs/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
    17 KB (2,624 words) - 00:07, 16 December 2021
  • Old Deposition Data - 2021-12-15
    Copied on 2021-12-14 ...ZYI-u4XH69Hnbe3jkm1qKmrR8Rg/edit#gid=sharing Particulates(Gain4) in PECVD#1-OLD DATA 2015]
    31 KB (4,516 words) - 00:18, 16 December 2021
  • ICP Etching Recipes
    ==Edge-Bead Removal (DSEiii)== ...sure to remove photoresist from edges of wafer, or PR may stick to the top-side wafer clamp and destroy your wafer during unload!
    28 KB (4,350 words) - 17:09, 9 April 2024
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