Difference between revisions of "Vacuum Deposition Recipes"

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! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
  
! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div>
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! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
 
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| width="65" | [[E-Beam 1 (Sharon)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
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| width="65" | [[E-Beam 2 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
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| width="65" | [[E-Beam 3 (Temescal)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
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| width="65" | [[E-Beam 4 (CHA)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
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| width="65" | [[Sputter 1 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
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| width="85" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
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| width="75" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
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| width="75" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
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| width="85" | [[Sputter 5 (Lesker AXXIS)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
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| width="65" | [[Thermal Evap 1]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal Evap 1]]
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| width="65" | [[Thermal Evap 2 (Solder)]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal Evap 2 (Solder)]]
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| width="115" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
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| width="115" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
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| width="75" | [[Unaxis VLR ICP-PECVD]]
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| width="65" bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
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! width="75" bgcolor="#D0E7FF" align="center" | Ag
 
! width="75" bgcolor="#D0E7FF" align="center" | Ag
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| [[PECVD Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
 
| [[PECVD Recipes#SiN_deposition_.28PECVD_.231.29|Y]]
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| [[PECVD Recipes#SiN deposition (PECVD #2)|Y]]
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| [[PECVD Recipes#SiN_deposition_.28PECVD_.232.29|Y]]
 
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| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #1)|Y]]
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| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2_deposition_.28PECVD_.231.29|Y]]
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| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2 deposition (PECVD #2)|Y]]
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| bgcolor="EEFFFF" | [[PECVD Recipes#SiO2_deposition_.28PECVD_.232.29|Y]]
 
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|-
  
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! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
 
! width="75" bgcolor="#D0E7FF" align="center" | '''Material'''
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| width="65" | [[E-Beam 1 (Sharon)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
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| width="65" | [[E-Beam 2 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
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| width="65" | [[E-Beam 3 (Temescal)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
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| width="65" | [[E-Beam 4 (CHA)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
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| width="65" | [[Sputter 1 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
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| width="85" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
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| width="75" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
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| width="75" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
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| width="85" | [[Sputter 5 (Lesker AXXIS)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
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| width="65" | [[Thermal 1]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal 1]]
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| width="65" | [[Thermal 2]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal 2]]
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| width="115" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
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| width="115" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
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| width="75" | [[Unaxis VLR ICP-PECVD]]
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| width="65" bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
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| [[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposision]]
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| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposision]]
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| [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam Deposition]]
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| width="65" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam Deposition]]
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| [[Molecular Vapor Deposition]]
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| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition]]
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Revision as of 10:33, 18 July 2012

Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Ion-Beam Deposition (IBD) Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Thermal Evap 1 Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD
Ag
Al
















Al2O3
AlN
















Au
B
















Co
Cr
















Cu
Fe
















Ge
Hf
















HfO2
In
















Ir
ITO
Mo
Nb
Ni
Pd
Pt
Ru
Si
SiN Y Y
SiO2 Y Y
SiOxNy
Sn
SrF2
Ta
Ta2O5
Ti
TiN
TiO2
V
W
Zn
ZnO2
Zr
ZrO2
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Thermal 1 Thermal 2 PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposision Ion Beam Deposition Molecular Vapor Deposition
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