Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4"
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|[https://www.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
|[https://www.nanotech.ucsb.edu/wiki/images/f/f9/SiO2_Etch_using_ICP2-no_O2-a.pdf] |
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− | |3/6/ |
+ | |3/6/2019 |
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|1.23 |
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|85.6 |
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− | |[[:File:SiO2 Etch using ICP2 no O2-3-06-2019.pdf]] |
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