Difference between revisions of "Template:Announcements"
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We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. |
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. |
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// [[User:John d|John d]] 17:22, 15 June 2018 (PDT) |
// [[User:John d|John d]] 17:22, 15 June 2018 (PDT) |
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| + | ===== RIE#3: RF Issue ===== |
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| + | RF issues on RIE3 power supply. System is being investigated. |
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| + | // [[User:Thibeault|Thibeault]] 08:31, 18 September 2018 (PDT) |
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| + | |||
| + | ===== Sputter#4: TiW gun shorted ===== |
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| + | Gun will be looked at during next opening this Friday 9/21. |
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| + | // [[User:Thibeault|Thibeault]] 08:31, 18 September 2018 (PDT) |
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Revision as of 08:31, 18 September 2018
UCSB NanoFab Announcements
Gasonics Down
Still troubleshooting, awaiting spare parts. // John d 11:26, 17 September 2018 (PDT)
RIE#5: Software Upgrades
RIE#5 Will be down next week from approximately Monday Sept. 17th to Thursday Sept. 20th, for a software upgrade to the same software running on the other PlasmaTherm tools. All users will need to be retrained after the upgrade is complete. // John d 15:16, 11 September 2018 (PDT)
PECVD#1: Software Upgrade
Plasmatherm will be upgrading the system software on September 17th. The upgrade will take 3-5 days. After the upgrade is complete, everyone must be re-certified to use the tool. Please document any custom recipes that you may have, in case they can't be copied over. // John d 06:38, 15 August 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)
RIE#3: RF Issue
RF issues on RIE3 power supply. System is being investigated. // Thibeault 08:31, 18 September 2018 (PDT)
Sputter#4: TiW gun shorted
Gun will be looked at during next opening this Friday 9/21. // Thibeault 08:31, 18 September 2018 (PDT)