Difference between revisions of "Template:Announcements"
(AFM up) |
m (delted old notes) |
||
Line 12: | Line 12: | ||
AFM head has been returned from service, system is up for use. Please notify NanoFab@ece.ucsb.edu if you experience any problems with it. |
AFM head has been returned from service, system is up for use. Please notify NanoFab@ece.ucsb.edu if you experience any problems with it. |
||
// [[User:John d|John d]] 17:24, 15 June 2018 (PDT) |
// [[User:John d|John d]] 17:24, 15 June 2018 (PDT) |
||
− | |||
− | ===== IBD Up ===== |
||
− | Periodic Maintenance is complete, system up and ready for use. |
||
− | // [[User:John d|John d]] 17:23, 15 June 2018 (PDT) |
||
− | |||
− | ===== Stepper #2 Up ===== |
||
− | The service and repair of the Autostep is complete. Please let us know immediately if you have any issues.The system is up and ready for your use. |
||
− | // [[User:John d|John d]] 15:05, 15 June 2018 (PDT) |
||
===== RIE#5: SiCl4 Issue ===== |
===== RIE#5: SiCl4 Issue ===== |
Revision as of 13:31, 20 June 2018
UCSB NanoFab Announcements
AFM: Up
AFM head has been returned from service, system is up for use. Please notify NanoFab@ece.ucsb.edu if you experience any problems with it. // John d 17:24, 15 June 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)
Solvent Bench Bay 7 - Heated Bath
We have disabled the auto refill due to a high water level. Please use the manual fill and a manual drain button at the center top of the head case. Users of the bath might need to fill or drain as you insert/remove your beakers. Please be careful with other user's beakers. // John d 17:18, 6 June 2018 (PDT)