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  • Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher
    |SEM Images (45d, cross section) ...CP_010923_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/2/2b/CS_FICP_010923_003.jpg <nowiki>[CS]</nowiki>]
    5 KB (758 words) - 15:03, 9 January 2023
  • ASML Stepper 3 - Job Creator
    ...the die, and then use the ASML '''''Modify Job''''' GUI to distribute the Images across the wafer correctly. Users are welcome to contribute such a functio
    2 KB (325 words) - 21:08, 7 April 2022
  • Autostep 200 Mask Making Guidance
    ...≥1mm @ 1x wafer-scale / ≥5mm @ 5x mask-scale of chrome in between adjacent Images/patterns. *For multiple Images per photomask, you'll need to calculate the distance, in mm, for the shutte
    7 KB (1,123 words) - 14:44, 4 January 2024
  • Lithography Recipes
    | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4210] | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4330RS]
    23 KB (3,174 words) - 12:37, 9 May 2024
  • Oxford ICP Etcher - Process Control Data
    !'''SEM Images''' ...rd_011123_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/4/4a/Cs_oxford_011123_002.jpg <nowiki>[CS]</nowiki>]
    8 KB (1,214 words) - 15:38, 12 January 2023
  • ICP-Etch (Unaxis VLR)
    *[//wiki.nanotech.ucsb.edu/wiki/images/8/80/PM1_Wiki_Operational_Procedure_3-14-14.pdf Operating Instructions]
    2 KB (313 words) - 16:31, 29 September 2022
  • Contact Alignment Recipes
    *[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe] *[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]
    9 KB (1,195 words) - 12:20, 1 December 2022
  • Old Deposition Data - 2021-12-15
    *[https://wiki.nanotech.ucsb.edu/wiki/images/4/4a/New_PECVD1-LS_SIN-Turner05recipe_2014_LS_SIN_recipe.pdf LS SiN Standar *[https://wiki.nanotech.ucsb.edu/wiki/images/2/24/New_PECVD1-LS_SION-recipe_2014_LS_SION_recipe.pdf SiO<sub>x</sub>N<sub
    31 KB (4,516 words) - 00:18, 16 December 2021
  • Atomic Layer Deposition (Oxford FlexAL)
    *[https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cluster_Tool_Operating_Instructions_Rev_B.pdf Operating Instruc *[//wiki.nanotech.ucsb.edu/wiki/images/1/14/Wet_Etching_of_ALD_Al2O3_Plasma_300C.xls Al2O3 Plasma 300C Wet Etch Ra
    3 KB (377 words) - 14:56, 8 March 2023
  • ICP Etching Recipes
    *[//wiki.nanotech.ucsb.edu/wiki/images/4/4a/10-Si_Etch_Bosch_DSEIII.pdf Bosch Process Recipe and Characterization] *[//wiki.nanotech.ucsb.edu/wiki/images/8/8f/10-Si_Etch_Single_Step_Smooth_Sidewall_DSEIII.pdf Single Step Silicon
    28 KB (4,356 words) - 12:49, 7 May 2024
  • Test Data of etching SiO2 with CHF3/CF4
    !SEM Images; ...n2_011123_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/e/eb/Cs_pan2_011123_002.jpg <nowiki>[CS]</nowiki>]
    7 KB (976 words) - 13:15, 11 January 2023
  • ASML Stepper 3 Standard Operating Procedure
    #''Optional'': Copy you job to a new job file with the layers/images you want to shoot, but which does not fill the entire wafer to the edges - ...ALL the Images in the job! Use the '''(Preset)''' button to apply to all Images in the job.
    9 KB (1,431 words) - 13:59, 23 April 2023
  • SEM 1 (JEOL IT800SHL)
    *J[https://wiki.nanofab.ucsb.edu/w/images/1/10/JEOL_IT800SHL_Operating_Procedure.docx EOL IT800SHL Operating Procedur **Stig is the most common cause of blurry images.
    3 KB (487 words) - 21:07, 29 February 2024
  • CAIBE (Oxford Ion Mill)
    *[https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cluster_Tool_Operating_Instructions_Rev_B.pdf Cluster Operating *[https://wiki.nanofab.ucsb.edu/w/images/4/4d/Oxford_Ion_Mill_SOP.pdf Ion Mill SOP]
    4 KB (569 words) - 09:47, 21 December 2023
  • Wet Etching Recipes
    *[//wiki.nanotech.ucsb.edu/w/images/c/c3/Ta_and_Cr_E-beam_deposition_and_wet_etch_test.pdf Selective Wet Etch o *[//wiki.nanotech.ucsb.edu/w/images/d/dc/ITO_Deposition-250C-Ebeam2-HCl-Wet-Etch.pdf Wet Etch of ITO using Heat
    10 KB (1,405 words) - 10:34, 1 April 2024
  • Editing Tutorials
    ===Inserting images into a page=== ###Image Widths (1st field) of about 200-600px look good as stand-alone images, floating on the page.
    18 KB (3,183 words) - 12:52, 4 September 2021
  • Microscopes
    ...brations for all NanoFab microscopes: [https://wiki.nanotech.ucsb.edu/wiki/Images/uploads/2020/AmScopeCalsAll.magn Download Here] *[https://wiki.nanotech.ucsb.edu/wiki/images/8/80/Nikon-Microscope-Manual.pdf Manual for Nikon Eclipse L200D]
    10 KB (1,271 words) - 17:02, 1 November 2023
  • Contact Aligner (SUSS MA-6)
    ...tem, at 5x, 10x, or 20x magnification. The backside alignment system takes images of the photomask from the ''underside'', then overlays that image digitally *[https://wiki.nanofab.ucsb.edu/w/images/4/41/MA-6_SOP_Rev_D.pdf MA6 Standard Operating Procedure, includes BSA]
    4 KB (595 words) - 14:08, 22 September 2023
  • COVID-19 User Policies
    *[//wiki.nanotech.ucsb.edu/w/images/e/ea/User_Protocols_Coronavirus_2020-09-14-1.pdf Full NanoFab COVID-19 Prot
    5 KB (811 words) - 16:56, 13 February 2023
  • Calculators + Utilities
    ...brations for all NanoFab microscopes: [https://wiki.nanotech.ucsb.edu/wiki/Images/uploads/2020/AmScopeCalsAll.magn Download Here] ...ilmetrics)] - online analysis/storage/sharing of 3D topographical data and images.
    16 KB (2,337 words) - 22:44, 4 April 2024

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