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  • |type = Thermal Processing
    1 KB (170 words) - 11:43, 31 March 2014
  • This computer-controlled, turbo-pumped RIE is the "work horse" of the processing laboratory due to it's ease of operation and versatility. It can be operate ...itor and chart recorder. Various devices that use this tool as an integral processing step include: in-plane lasers, VCSELs, micro-lenses, Bragg-Fresnel lens, FE
    3 KB (390 words) - 10:54, 28 November 2022
  • =====Thermal Processing for Photolithography===== =Wet Processing=
    7 KB (844 words) - 11:52, 1 March 2024
  • ...mis LSD-155Lt is a production scribe and break system that can be used for processing large grids, arrays of laser bars, cleaving high quality mirror facets, and
    1 KB (189 words) - 08:16, 26 September 2023
  • |type = Wet Processing The facility contains 4 stainless steel solvent benches for general processing using organic solvents. All solvent waste (except for certain chemicals tha
    13 KB (1,931 words) - 13:24, 21 March 2024
  • .../index.php?title=Tool_List#Thermal_Processing See the full list of Thermal Processing tools here.]
    2 KB (211 words) - 09:41, 24 August 2022
  • |type = Thermal Processing
    2 KB (229 words) - 10:53, 20 September 2023
  • ...brication tools and equipment, such as vacuum deposition, etchers, thermal processing etc. ...The Process Group helps to ensure that equipment is providing the expected processing capabilities.
    5 KB (664 words) - 09:42, 11 March 2024
  • |type = Thermal Processing
    2 KB (268 words) - 14:50, 30 October 2023
  • *: Wet Processing *: Thermal Processing
    7 KB (1,028 words) - 01:07, 19 October 2022
  • *: Wet Processing *: Thermal Processing
    8 KB (1,058 words) - 01:14, 19 October 2022
  • *: Wet Processing *: Thermal Processing
    8 KB (1,159 words) - 07:57, 30 August 2022
  • ...ely 10 um, allowing for measurement of thin films at various points in the processing.
    2 KB (274 words) - 07:30, 13 May 2022
  • ...eeexplore.ieee.org/abstract/document/546406/ Etch rates for Micromachining Processing (IEEE Jnl. MEMS, 1996)] - includes tables of etch rates of numerous metals ...re.ieee.org/xpls/abs_all.jsp?arnumber=546406 Etch rates for micromachining processing]
    10 KB (1,405 words) - 10:34, 1 April 2024
  • |type = Wet Processing
    2 KB (340 words) - 14:41, 8 November 2022
  • ...t and versatile FIB patterning for simplified, flexible, 3D, and automated processing
    2 KB (285 words) - 09:56, 15 March 2021
  • *: Wet Processing *: Thermal Processing
    10 KB (1,365 words) - 21:57, 2 August 2022
  • ...r]], or a custom graphite fixture in conjunction with any one of [[Thermal Processing|numerous ovens]], such as the N2-purged [[Tube Furnace Wafer Bonding (Therm [[Category:Processing]]
    5 KB (713 words) - 16:24, 30 January 2024
  • ...he was a Senior Engineer working on optical packaging, III/V semiconductor processing, and facility design and construction. The primary goal at the Goleta Ciena
    2 KB (333 words) - 08:29, 7 August 2020
  • ...wafer surface before HMDS application. This is very important for wet-etch processing through small, high aspect ratio photoresist holes or lines.
    2 KB (347 words) - 13:06, 11 November 2022

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