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  • Lift-Off with DUV Imaging + PMGI Underlayer
    Please see our [https://wiki.nanotech.ucsb.edu/w/images/b/bc/Liftoff-Techniques.pdf Bi-Layer Lift-Off Tutorial] to understand the l ===Images / Examples===
    4 KB (608 words) - 16:32, 27 April 2022
  • Oxford Etcher - Sample Size Effect on Etch Rate
    !SEM Images |[https://wiki.nanotech.ucsb.edu/w/images/9/90/2022-01-11_Oxford_InP_Ridge_Wiki_Post_-_Cal01.pdf]
    2 KB (256 words) - 16:05, 20 March 2023
  • Measurements and Imaging with Amscope Camera - Quickstart Usage Guide
    #Click the Camera in the software to begin acquiring images in the software:[[File:Amscope 02 annot camera link.png|alt=screenshot of s ...n menu called '''Magnification''', which is used for measuring <u>live</u> images. (This is also available from the top "Options" pull down menu). Choose th
    4 KB (636 words) - 16:57, 16 October 2023
  • Tube Furnace (Tystar 8300)
    [//wiki.nanotech.ucsb.edu/w/images/8/89/TystarMechDrawWaferBoat.pdf Tystar Wafer Boat Drawing - 4" Wafer with *[//wiki.nanotech.ucsb.edu/w/images/8/8a/Tystar_Operational_Procedure.pdf Operating Instructions]
    4 KB (580 words) - 11:15, 7 March 2024
  • Sputtering Recipes
    *[//wiki.nanotech.ucsb.edu/wiki/images/1/15/Fe_and_Co_Films_using_Sputter-3.pdf Fe and Co Deposition Recipe] *[//wiki.nanotech.ucsb.edu/wiki/images/5/5e/Cu_Film_using_Sputter-3.pdf Cu Deposition Recipe]
    16 KB (2,290 words) - 21:36, 21 September 2023
  • News Feed
    Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please c
    2 KB (228 words) - 12:10, 4 October 2023
  • Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher
    |SEM Images (45d, cross section) ...CP_010923_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/2/2b/CS_FICP_010923_003.jpg <nowiki>[CS]</nowiki>]
    5 KB (758 words) - 15:03, 9 January 2023
  • ASML Stepper 3 - Job Creator
    ...the die, and then use the ASML '''''Modify Job''''' GUI to distribute the Images across the wafer correctly. Users are welcome to contribute such a functio
    2 KB (325 words) - 21:08, 7 April 2022
  • Autostep 200 Mask Making Guidance
    ...≥1mm @ 1x wafer-scale / ≥5mm @ 5x mask-scale of chrome in between adjacent Images/patterns. *For multiple Images per photomask, you'll need to calculate the distance, in mm, for the shutte
    7 KB (1,123 words) - 14:44, 4 January 2024
  • Lithography Recipes
    | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4210] | bgcolor="#D0E7FF" align="center" |[//wiki.nanotech.ucsb.edu/w/images/f/fc/AXP4000pb-Datasheet.pdf AZ4330RS]
    23 KB (3,174 words) - 12:37, 9 May 2024
  • Oxford ICP Etcher - Process Control Data
    !'''SEM Images''' ...rd_011123_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/4/4a/Cs_oxford_011123_002.jpg <nowiki>[CS]</nowiki>]
    8 KB (1,214 words) - 15:38, 12 January 2023
  • ICP-Etch (Unaxis VLR)
    *[//wiki.nanotech.ucsb.edu/wiki/images/8/80/PM1_Wiki_Operational_Procedure_3-14-14.pdf Operating Instructions]
    2 KB (313 words) - 16:31, 29 September 2022
  • Contact Alignment Recipes
    *[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe] *[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]
    9 KB (1,195 words) - 12:20, 1 December 2022
  • Old Deposition Data - 2021-12-15
    *[https://wiki.nanotech.ucsb.edu/wiki/images/4/4a/New_PECVD1-LS_SIN-Turner05recipe_2014_LS_SIN_recipe.pdf LS SiN Standar *[https://wiki.nanotech.ucsb.edu/wiki/images/2/24/New_PECVD1-LS_SION-recipe_2014_LS_SION_recipe.pdf SiO<sub>x</sub>N<sub
    31 KB (4,516 words) - 00:18, 16 December 2021
  • Atomic Layer Deposition (Oxford FlexAL)
    *[https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cluster_Tool_Operating_Instructions_Rev_B.pdf Operating Instruc *[//wiki.nanotech.ucsb.edu/wiki/images/1/14/Wet_Etching_of_ALD_Al2O3_Plasma_300C.xls Al2O3 Plasma 300C Wet Etch Ra
    3 KB (377 words) - 14:56, 8 March 2023
  • ICP Etching Recipes
    *[//wiki.nanotech.ucsb.edu/wiki/images/4/4a/10-Si_Etch_Bosch_DSEIII.pdf Bosch Process Recipe and Characterization] *[//wiki.nanotech.ucsb.edu/wiki/images/8/8f/10-Si_Etch_Single_Step_Smooth_Sidewall_DSEIII.pdf Single Step Silicon
    28 KB (4,356 words) - 12:49, 7 May 2024
  • Test Data of etching SiO2 with CHF3/CF4
    !SEM Images; ...n2_011123_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/e/eb/Cs_pan2_011123_002.jpg <nowiki>[CS]</nowiki>]
    7 KB (976 words) - 13:15, 11 January 2023
  • SEM 1 (JEOL IT800SHL)
    *J[https://wiki.nanofab.ucsb.edu/w/images/1/10/JEOL_IT800SHL_Operating_Procedure.docx EOL IT800SHL Operating Procedur **Stig is the most common cause of blurry images.
    3 KB (425 words) - 13:01, 16 May 2024
  • ASML Stepper 3 Standard Operating Procedure
    #''Optional'': Copy you job to a new job file with the layers/images you want to shoot, but which does not fill the entire wafer to the edges - ...ALL the Images in the job! Use the '''(Preset)''' button to apply to all Images in the job.
    9 KB (1,431 words) - 13:59, 23 April 2023
  • CAIBE (Oxford Ion Mill)
    *[https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cluster_Tool_Operating_Instructions_Rev_B.pdf Cluster Operating *[https://wiki.nanofab.ucsb.edu/w/images/4/4d/Oxford_Ion_Mill_SOP.pdf Ion Mill SOP]
    4 KB (569 words) - 09:47, 21 December 2023

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