User contributions
Jump to navigation
Jump to search
- 16:14, 4 February 2021 diff hist +260 N Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Fluorine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Average..." Tag: Visual edit
- 16:12, 4 February 2021 diff hist +1 ICP Etching Recipes →SiO2 Etch Historical Data Tag: Visual edit
- 16:07, 4 February 2021 diff hist +1 ICP Etching Recipes →SiO2 Etch Historical Data
- 18:33, 3 February 2021 diff hist +59 InP Etch Rate and Selectivity (InP/SiO2) add another pic Tag: Visual edit
- 18:32, 3 February 2021 diff hist 0 N File:IP210119.pdf current
- 18:32, 3 February 2021 diff hist +59 InP Etch Rate and Selectivity (InP/SiO2) add a pic Tag: Visual edit
- 18:31, 3 February 2021 diff hist 0 N File:IP210117.pdf current
- 18:28, 3 February 2021 diff hist +35 InP Etch Rate and Selectivity (InP/SiO2) add a data point Tag: Visual edit
- 18:43, 2 February 2021 diff hist 0 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:39, 2 February 2021 diff hist +19 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:37, 2 February 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher current Tag: Visual edit
- 18:36, 2 February 2021 diff hist +4 Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher Tag: Visual edit
- 18:36, 2 February 2021 diff hist +259 N Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Florine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit
- 18:35, 2 February 2021 diff hist +11 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:33, 2 February 2021 diff hist +4 Test Data of etching SiO2 with CHF3/CF4-Florine current Tag: Visual edit
- 18:30, 2 February 2021 diff hist +4 Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher current Tag: Visual edit
- 18:29, 2 February 2021 diff hist +59 Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher adding a SEM Tag: Visual edit
- 18:27, 2 February 2021 diff hist 0 N File:FE210206.pdf current
- 18:18, 2 February 2021 diff hist +259 N Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Florine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit
- 16:53, 2 February 2021 diff hist +16 Test Data of etching SiO2 with CHF3/CF4-Florine Tag: Visual edit