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- 15:38, 12 January 2023 diff hist +108 Oxford ICP Etcher - Process Control Data added chamber wet clean current Tag: Visual edit
- 08:33, 11 January 2023 diff hist -194 Template:Announcements nanofab open for LN2 delivery
- 16:28, 10 January 2023 diff hist +66 Template:Announcements LN2 closure
- 17:20, 6 January 2023 diff hist +7 Oxford ICP Etcher - Process Control Data →Etch Rate Dependence on Sample Size (Oxford ICP Etcher): changed name to emphasize Sampel Size effect Tag: Visual edit
- 11:28, 6 January 2023 diff hist +170 Process Group - Process Control Data →ICP-PECVD (Unaxis VLR Dep): link to SiO2/SiN plots separately Tag: Visual edit
- 17:07, 5 January 2023 diff hist +464 Template:News added info about process control data
- 10:43, 5 January 2023 diff hist +182 PECVD Recipes →ICP-PECVD (Unaxis VLR): added "geenral recipe notes" Tag: Visual edit
- 19:22, 3 January 2023 diff hist +126 Wet Benches →Develop Benches: added megasonic Tag: Visual edit
- 18:53, 3 January 2023 diff hist +66 Wafer Bonder (SUSS SB6-8E) →Detailed Specifications: link to MA6 Tag: Visual edit
- 17:41, 3 January 2023 diff hist -21 m Suss Aligners (SUSS MJB-3) →Optical Spectrum with Filter for i-line Exposure Tag: Visual edit
- 17:40, 3 January 2023 diff hist +170 Suss Aligners (SUSS MJB-3) added alignment marks GDS file, made optical spectra smaller. Tag: Visual edit
- 17:38, 3 January 2023 diff hist +135 Contact Aligner (SUSS MA-6) →Documentation: added link to alignment mark GDS file Tag: Visual edit
- 15:32, 3 January 2023 diff hist +481 ASML Stepper 3 - UCSB Test Reticles →Alignment Markers: added CAD files for alignment marks Tag: Visual edit
- 15:29, 3 January 2023 diff hist +72 N File:MA6-FrontBack AlignMarks only.gds CAD File for front/back alignment marks on Contact Aligner current
- 15:26, 3 January 2023 diff hist +90 N File:Contact-AlignFront.gds CAD file for contact alignment mark, as printed on ASML DUV Mask "UCSB-OPC1" current
- 15:25, 3 January 2023 diff hist +95 N File:EBL-GlobalMulti NEG.gds CAD file for EBL negative alignment mark, as printed on ASML DUV mask "UCSB-OPC1" current
- 15:23, 3 January 2023 diff hist +72 N File:EBL-GlobalMulti POS.gds EBL Alignment Mark as printed on ASML DUV Mask "UCSB-OPC1" current
- 15:22, 3 January 2023 diff hist +84 N File:GCA stepper align.gds GCA Stepper Alignment Mark as drawn on ASML DUV Mask Plate "UCSB-OPC1" current
- 11:06, 31 December 2022 diff hist -3 m Template:News →Raith Velion: FIB/SEM Installation
- 11:05, 31 December 2022 diff hist +42 Template:Announcements Lab open after Xmas shutdown