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- 11:47, 14 February 2022 diff hist 0 File:ASML Reticle Programming Params - MASKJAN2020 v1.xlsx John d uploaded a new version of File:ASML Reticle Programming Params - MyReticleBarCode v1.xlsx
- 13:49, 11 February 2022 diff hist +53 m ICP Etch 2 (Panasonic E626I) →Recipes Tag: Visual edit
- 13:48, 11 February 2022 diff hist +97 ICP Etch 1 (Panasonic E646V) separate process control section/link Tag: Visual edit
- 13:47, 11 February 2022 diff hist +59 ICP Etch 2 (Panasonic E626I) →Recipes: separate Process Control section/link Tag: Visual edit
- 13:24, 11 February 2022 diff hist +31 Test Data of etching SiO2 with CHF3/CF4 minor update to diamond experiemnt comment. Tag: Visual edit
- 13:23, 11 February 2022 diff hist -36 ICP Etching Recipes →ICP Etch 2 (Panasonic E640): updated ICP1 and ICP2 with Process Control sections for SiO2 etch tests. Tag: Visual edit
- 13:22, 11 February 2022 diff hist +252 N MediaWiki:Deletereason-dropdown added common NanoFab reasons for deletion current
- 13:19, 11 February 2022 diff hist +504 Test Data of etching SiO2 with CHF3/CF4-ICP1 new section :pasted data from CHF3/CF4/O2 etch data
- 13:13, 11 February 2022 diff hist +22 ICP Etching Recipes →SiO2 Etch Historical Data: reanmed to include tool name Tag: Visual edit
- 13:12, 11 February 2022 diff hist -37 ICP Etching Recipes →SiO2 Etching (Fluorine ICP Etcher): consolidated FL-ICP Prcoess Control data Tag: Visual edit
- 13:11, 11 February 2022 diff hist +493 Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher pasted Ning's 2nd data table, hilighted recipe changes and comment about data being "in progress"
- 12:28, 11 February 2022 diff hist +1 ICP Etching Recipes →PlasmaTherm/SLR Fluorine Etcher: moved historical data to top Tag: Visual edit
- 12:46, 4 February 2022 diff hist +260 Template:Announcements ASML maintenance
- 15:24, 1 February 2022 diff hist +3 m Autostep 200 Mask Making Guidance →Mask Layout Tag: Visual edit
- 15:23, 1 February 2022 diff hist +119 m Autostep 200 Mask Making Guidance →Photomask Ordering Info Tag: Visual edit
- 10:00, 1 February 2022 diff hist +327 Autostep 200 Mask Making Guidance →Photomask Ordering Info: added info Tag: Visual edit
- 09:39, 1 February 2022 diff hist +428 Autostep 200 Mask Making Guidance →Alignment Marks: adde Vernier CAD file Tag: Visual edit
- 09:37, 1 February 2022 diff hist +110 N File:Vernier Template.gds Vernier Registration/Alignment Test structure for lithography. Designed by Demis D. John, 2008.
- 09:03, 1 February 2022 diff hist -14 m Stepper 2 (AutoStep 200) →Process Information Tag: Visual edit
- 17:30, 31 January 2022 diff hist +185 Autostep 200 Mask Making Guidance →Mask Layout: 2nd attempt to describe Shutter positioning Tag: Visual edit