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- 14:15, 13 November 2020 diff hist +40 Lithography Recipes →Photolithography Recipes
- 16:29, 3 November 2020 diff hist -120 PECVD Recipes →Low-Stress SiN deposition (PECVD #2)
- 16:28, 3 November 2020 diff hist -127 PECVD Recipes →SiN deposition (PECVD #2)
- 16:28, 3 November 2020 diff hist -112 PECVD Recipes →SiO2 deposition (PECVD #2)
- 12:32, 16 October 2020 diff hist +150 Stepper Recipes
- 21:28, 13 October 2020 diff hist -2 PECVD Recipes →SiO2 deposition (PECVD #1)
- 21:28, 13 October 2020 diff hist +118 PECVD Recipes →SiN deposition (PECVD #1)
- 09:38, 13 October 2020 diff hist -228 PECVD Recipes
- 09:14, 13 October 2020 diff hist -1 PECVD Recipes →Historical Particulate Data
- 09:13, 13 October 2020 diff hist +1 PECVD Recipes →PECVD 1 (PlasmaTherm 790)
- 09:13, 13 October 2020 diff hist -109 PECVD Recipes →SiN deposition (PECVD #1)
- 16:38, 9 October 2020 diff hist -10 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 16:37, 9 October 2020 diff hist +64 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 16:16, 9 October 2020 diff hist +45 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 16:14, 9 October 2020 diff hist +10 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 16:12, 9 October 2020 diff hist +7 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 15:42, 9 October 2020 diff hist 0 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 15:34, 9 October 2020 diff hist 0 Direct-Write Lithography Recipes →Negative Resist (MLA150)
- 15:33, 9 October 2020 diff hist +22 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 15:01, 9 October 2020 diff hist -1 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 14:58, 9 October 2020 diff hist +1 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 14:56, 9 October 2020 diff hist +4 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 14:52, 9 October 2020 diff hist +3 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 14:12, 9 October 2020 diff hist +19 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 11:41, 9 October 2020 diff hist +3 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 11:39, 9 October 2020 diff hist -2 Direct-Write Lithography Recipes →Maskless Aligner (Heidelberg MLA150)
- 11:38, 9 October 2020 diff hist +55 Direct-Write Lithography Recipes →Positive Resist (MLA150)
- 20:53, 14 July 2020 diff hist 0 PECVD Recipes →Uniformity Data
- 20:52, 14 July 2020 diff hist 0 PECVD Recipes →Uniformity Data
- 20:49, 14 July 2020 diff hist 0 PECVD Recipes →Uniformity Data
- 20:47, 14 July 2020 diff hist 0 PECVD Recipes →Uniformity Data
- 20:46, 14 July 2020 diff hist -124 PECVD Recipes →SiN deposition (PECVD #2)
- 20:45, 14 July 2020 diff hist 0 PECVD Recipes →Thin-Film Properties
- 20:43, 14 July 2020 diff hist +126 PECVD Recipes →Thin-Film Properties
- 20:41, 14 July 2020 diff hist 0 PECVD Recipes →SiO2 deposition (PECVD #2)
- 20:40, 14 July 2020 diff hist +1 PECVD Recipes →PECVD 2 (Advanced Vacuum)
- 12:03, 2 July 2020 diff hist -8 Unaxis wafer coating procedure →a) Prepare wafers: Tag: Visual edit
- 12:02, 2 July 2020 diff hist -20 Unaxis wafer coating procedure →1. Unaxis deposition - 300nm of SiO2 LDR film @250°C Tag: Visual edit
- 12:01, 2 July 2020 diff hist +29 Unaxis wafer coating procedure Tag: Visual edit
- 12:01, 2 July 2020 diff hist +7 Unaxis wafer coating procedure Tag: Visual edit
- 12:00, 2 July 2020 diff hist +4,199 N Unaxis wafer coating procedure Created page with "'''1. Unaxis deposition - 300nm of SiO2 LDR film @250°C''' a) Prepare wafers: · Regular 4 " Si wafer ~500nm think for seasoning · Your substrate for d..." Tag: Visual edit
- 11:47, 2 July 2020 diff hist -58 ICP-PECVD (Unaxis VLR) Tag: Visual edit
- 11:44, 2 July 2020 diff hist +65 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
- 11:42, 2 July 2020 diff hist +68 N Wafer coating procedure Created page with "[https://wiki.nanotech.ucsb.edu/wiki/File:Unaxis_SOP_3-30-2020.docx]" current Tag: Visual edit
- 11:41, 2 July 2020 diff hist +4 ICP-PECVD (Unaxis VLR) →Documentation: wafer coating procedure correction Tag: Visual edit
- 11:37, 2 July 2020 diff hist -76 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
- 11:36, 2 July 2020 diff hist +65 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
- 22:39, 11 June 2020 diff hist 0 PECVD Recipes →Thin-Film Properties
- 22:37, 11 June 2020 diff hist -125 PECVD Recipes →Thin-Film Properties
- 22:37, 11 June 2020 diff hist +125 PECVD Recipes →Thin-Film Properties
- 10:12, 27 May 2020 diff hist -17 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 10:12, 27 May 2020 diff hist +77 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 10:10, 27 May 2020 diff hist +40 N File:SOP for Advanced Vacuum PECVD.pdf 5-27-2020 Biljana Stamenic current
- 10:04, 27 May 2020 diff hist +49 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 10:02, 27 May 2020 diff hist -58 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:58, 27 May 2020 diff hist +6 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:58, 27 May 2020 diff hist -8 PECVD 2 (Advanced Vacuum) Tag: Visual edit
- 09:55, 27 May 2020 diff hist +63 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:54, 27 May 2020 diff hist +6 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:54, 27 May 2020 diff hist +15 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:53, 27 May 2020 diff hist -91 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:47, 27 May 2020 diff hist +65 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:46, 27 May 2020 diff hist +4 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:46, 27 May 2020 diff hist +25 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:45, 27 May 2020 diff hist -28 PECVD 2 (Advanced Vacuum) →Documentation
- 09:43, 27 May 2020 diff hist +61 N Operating Instructions Created page with "Advanced Vacuum PECVD.pdf" current Tag: Visual edit
- 09:40, 27 May 2020 diff hist +4 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 09:36, 27 May 2020 diff hist 0 N File:Advanced Vacuum PECVD.pdf current
- 09:31, 27 May 2020 diff hist +1 PECVD 1 (PlasmaTherm 790) →Documentation Tag: Visual edit
- 08:50, 8 May 2020 diff hist -151 PECVD Recipes →ICP-PECVD (Unaxis VLR) Tag: Visual edit
- 17:16, 22 April 2020 diff hist +1 PECVD Recipes →SiN deposition (PECVD #1)
- 17:16, 22 April 2020 diff hist -29 PECVD Recipes →SiN deposition (PECVD #1)
- 17:08, 22 April 2020 diff hist -37 PECVD Recipes →SiO2 deposition (PECVD #1)
- 16:57, 22 April 2020 diff hist +57 PECVD1 Wafer Coating Process Tag: Visual edit
- 16:54, 22 April 2020 diff hist +18 Wafer Coating Process Traveler current Tag: Visual edit
- 16:53, 22 April 2020 diff hist -18 Wafer Coating Process Traveler link to recipes Tag: Visual edit
- 16:52, 22 April 2020 diff hist +54 Wafer Coating Process Traveler Tag: Visual edit
- 16:50, 22 April 2020 diff hist +1,475 Wafer Coating Process Traveler →STD SiO2 Tag: Visual edit
- 16:48, 22 April 2020 diff hist -8 Wafer Coating Process Traveler →STD SiO2 Tag: Visual edit
- 16:47, 22 April 2020 diff hist +724 Wafer Coating Process Traveler →Standard oxide deposition Tag: Visual edit
- 16:43, 22 April 2020 diff hist -7 Wafer Coating Process Traveler →STD LS Nitride2 at 300C Tag: Visual edit
- 16:42, 22 April 2020 diff hist -3,906 Wafer Coating Process Traveler Replaced content with "There are three standard recipes : STD SiO2, STD Nitride2, and STD LS Nitride2 at 300C. Instructions bellow explain how to run each of the recipes ( seasoning, deposition,..." Tags: Replaced Visual edit
- 16:38, 22 April 2020 diff hist +4 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 16:38, 22 April 2020 diff hist -9 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 16:37, 22 April 2020 diff hist +78 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 16:36, 22 April 2020 diff hist +93 PECVD 2 (Advanced Vacuum) →Documentation Tag: Visual edit
- 16:35, 22 April 2020 diff hist +21 PECVD 2 (Advanced Vacuum) Tag: Visual edit
- 16:33, 22 April 2020 diff hist +11 PECVD1 Wafer Coating Process SiN and SiO2 depositions Tag: Visual edit
- 16:31, 22 April 2020 diff hist -13 PECVD1 Wafer Coating Process →PECVD#1 SiN @250C Tag: Visual edit
- 16:30, 22 April 2020 diff hist +49 PECVD1 Wafer Coating Process →PECVD#1 SiN @250C Tag: Visual edit
- 16:28, 22 April 2020 diff hist +4 PECVD1 Wafer Coating Process Tag: Visual edit
- 16:26, 22 April 2020 diff hist +16 PECVD1 Wafer Coating Process
- 16:23, 22 April 2020 diff hist -897 PECVD1 Wafer Coating Process Tag: Visual edit
- 16:21, 22 April 2020 diff hist +137 PECVD 1 (PlasmaTherm 790) →Documentation Tag: Visual edit
- 16:19, 22 April 2020 diff hist +112 PECVD1 Wafer Coating Process →SiO2 @250C Tag: Visual edit
- 16:18, 22 April 2020 diff hist +18 PECVD1 Wafer Coating Process Tag: Visual edit
- 16:14, 22 April 2020 diff hist +783 PECVD1 Wafer Coating Process Tag: Visual edit
- 16:09, 22 April 2020 diff hist -217 PECVD1 Wafer Coating Process →SiN @250C Tag: Visual edit
- 15:59, 22 April 2020 diff hist -6 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit
- 13:27, 22 April 2020 diff hist +11 ICP-PECVD (Unaxis VLR) →Documentation Tag: Visual edit