Difference between revisions of "Process Group - Process Control Data"
Jump to navigation
Jump to search
(→Etching (Process Control Data): link to FL-ICP google sheets (noahD)) |
m (→PlasmaTherm SLR Fluorine Etcher: fixed link to plot) |
||
| Line 44: | Line 44: | ||
*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Etch Data'''] |
*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Etch Data'''] |
||
| − | *[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit |
+ | *[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit#gid=1804752281 SiO<sub>2</sub> Etching with CHF3/CF4 - '''Plots'''] |
| − | **[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher| |
+ | **OLD - [[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|SiO<sub>2</sub> Etching with CHF3/CF4 (FL-ICP]]) |
| − | *** |
+ | ***''No data prior to 2023-01-20'' |
===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]=== |
===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]=== |
||
Revision as of 12:00, 20 January 2023
These are the same links found on individual tool pages, in the Recipes > <<tool page>> > Process Control section.
Deposition (Process Control Data)
PECVD #1 (PlasmaTherm 790)
PECVD #2 (Advanced Vacuum)
ICP-PECVD (Unaxis VLR Dep)
- ICP-PECVD: Plots of SiO2 Films
- ICP-PECVD: Plots of Si3N4 Films
- ICP-PECVD: SiO2 Low-Dep Rate (LDR)
- ICP-PECVD: SiO2 High-Dep Rate (HDR)
- ICP-PECVD: Si3N4
- ICP-PECVD: Si3N4 Low-Stress
Ion Beam Sputter Deposition (Veeco Nexus)
Old Data (Pre 2022)
Old data in a different format can be found below:
Etching (Process Control Data)
PlasmaTherm SLR Fluorine Etcher
- SiO2 Etching with CHF3/CF4 - Etch Data
- SiO2 Etching with CHF3/CF4 - Plots
- OLD - SiO2 Etching with CHF3/CF4 (FL-ICP)
- No data prior to 2023-01-20
- OLD - SiO2 Etching with CHF3/CF4 (FL-ICP)