Difference between revisions of "Process Group - Process Control Data"

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(→‎ICP-PECVD (Unaxis VLR Dep): link to SiO2/SiN plots separately)
(→‎Etching (Process Control Data): link to FL-ICP google sheets (noahD))
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===[[ICP Etching Recipes#Process Control Data .28Fluorine ICP Etcher.29|PlasmaTherm SLR Fluorine Etcher]]===
 
===[[ICP Etching Recipes#Process Control Data .28Fluorine ICP Etcher.29|PlasmaTherm SLR Fluorine Etcher]]===
   
*[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|SiO<sub>2</sub> Etching with CHF3/CF4-Fluorine ICP Etcher]]
+
*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Etch Data''']
  +
*[https://docs.google.com/spreadsheets/d/15hYkCqL3UNNayt4sXrvVi4mBj-OSdnF7PE29mQW9AEY/edit?usp=sharing SiO<sub>2</sub> Etching with CHF3/CF4 - '''Plots''']
  +
**[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|OLD - SiO<sub>2</sub> Etching with CHF3/CF4 (FL-ICP)]]
  +
***[[Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher|''No data prior to 2023-01-20'']]
   
 
===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]===
 
===[[ICP Etching Recipes#Process Control Data .28Panasonic 1.29|Panasonic ICP #1]]===

Revision as of 11:46, 20 January 2023

These are the same links found on individual tool pages, in the Recipes > <<tool page>> > Process Control section.

Deposition (Process Control Data)

PECVD #1 (PlasmaTherm 790)

PECVD #2 (Advanced Vacuum)

ICP-PECVD (Unaxis VLR Dep)

Ion Beam Sputter Deposition (Veeco Nexus)

Old Data (Pre 2022)

Old data in a different format can be found below:

Etching (Process Control Data)

PlasmaTherm SLR Fluorine Etcher

Panasonic ICP #1

Panasonic ICP#2

Unaxis VLR Etch

Oxford PlasmaPro Cobra Etcher