Difference between revisions of "Packaging Recipes"

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m (→‎Wafer Bonder (Logitech WBS7): link to procedure)
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!Flange Diam.
 
!Flange Diam.
 
!Blade Exposure
 
!Blade Exposure
 +
!
 
|-
 
|-
 
|2.187" (55.55mm)
 
|2.187" (55.55mm)
 
|47mm
 
|47mm
 
|4.275mm
 
|4.275mm
 +
|
 
|-
 
|-
 
|2.187" (55.55mm)
 
|2.187" (55.55mm)
 
|49mm
 
|49mm
 
|3.275mm
 
|3.275mm
 +
|
 
|-
 
|-
 
|2.187" (55.55mm)
 
|2.187" (55.55mm)
 
|51mm
 
|51mm
 
|2.275mm
 
|2.275mm
 +
|''51mm Currently Unavailable''
 
|-
 
|-
 
|2.187" (55.55mm)
 
|2.187" (55.55mm)
 
|52mm
 
|52mm
 
|1.775mm
 
|1.775mm
 +
|
 
|-
 
|-
 
|2.187" (55.55mm)
 
|2.187" (55.55mm)
 
|53mm
 
|53mm
 
|1.275mm
 
|1.275mm
 +
|
 
|}
 
|}
 
=== Mounting/Unmounting Samples ===
 
=== Mounting/Unmounting Samples ===

Revision as of 13:04, 24 July 2019

Dicing Saw Recipes (ADT 7100)

Recommended Dicing Parameters

Material Blade P/N Spindle Speed

(KRPM)

Cut Speed

(mm/s)

Alumina, AlN 2.187-8C-54RU-3 25 0.5-2
Ceramic 2.187-4C-30RU-3 18 0.5-2
GaAs 2.187-4C-9RU-3 35 1-5
GaN  (<550um) 2.187-4C-30RU-3 35 0.5-3
GaN  (>550um) 2.187-8C-30RU-3 35 0.5-2
Glass/Fused Silica 2.187-4C-22RU-3 25 1-5
InP 2.187-4C-9RU-3 35 1-5
QuCalculated Blades Exposuresartz 2.187-4C-30RU-3 25 1-5
Sapphire 2.187-8C-54RU-3 18 0.5-2
Si 2.187-4C-9RU-3 35 4-10
Si on Glasss 2.187-4C-9RU-3 25 1-5
SiC 2.187-8C-30RU-3 25 0.5-2
Ti 2.187-8C-54RU-3 15 0.5-2

Calculated Blade Exposures

Blade Diam Flange Diam. Blade Exposure
2.187" (55.55mm) 47mm 4.275mm
2.187" (55.55mm) 49mm 3.275mm
2.187" (55.55mm) 51mm 2.275mm 51mm Currently Unavailable
2.187" (55.55mm) 52mm 1.775mm
2.187" (55.55mm) 53mm 1.275mm

Mounting/Unmounting Samples

The UV-Release Tape dispenser is most-often used for mounting sample for dicing.

The Tape Model installed is Ultron 1042R. Data Sheet Here.

  • Procedure for mounting sample on UV-Release Tape
  • Full Release: 60 sec exposure
  • Partial Release for Shipping: 9 sec exposure

Surface Protection

Users most often use sacrificial photoresists to protect the surface from accumulating dicing dust. The static-buildup of dielectric films causes the dust to adhere strongly. Ensure that the PR thickness will adequately coat all your exposed topography (eg. use a ≥2µm thick PR for protecting 1.5-2.0µm tall etched features).

  1. Choose a photoresist of appropriate thickness, and spin-coat it & soft-bake it according to a standard recipe. Contact Alignment PR Recipes Stepper PR Recipes
  1. Perform your dicing
  2. Strip the PR in Acetone and ISO & N2 dry

Wafer Bonder (Logitech WBS7)

This tool is used for bonding samples to Silicon carrier wafers with CrystalBond wax.