Difference between revisions of "PECVD Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 159: Line 159:
  
 
*[//www.nanotech.ucsb.edu/wiki/images/9/98/STD_LSNitride2_12-14-18_recipe.pdf STD LSNitride2 12/14/2018]
 
*[//www.nanotech.ucsb.edu/wiki/images/9/98/STD_LSNitride2_12-14-18_recipe.pdf STD LSNitride2 12/14/2018]
**[//Users/biljana/Downloads/STD%20LS%20Nitride2-Adv.%20PECVD2%20Table%20recipe.xlsx%20-%20LS%20Nitride2%20recipe.pdf Table STD LS Nitride2]
+
*[//Users/biljana/Downloads/STD%20LS%20Nitride2-Adv.%20PECVD2%20Table%20recipe.xlsx%20-%20LS%20Nitride2%20recipe.pdf Table STD LS Nitride2]
  
 
*''Old Versions:''
 
*''Old Versions:''

Revision as of 14:46, 6 February 2020

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.

Historical Particulate Data

SiN deposition (PECVD #1)

Historical Data

Thin-Film Properties
Uniformity Data

SiO2 deposition (PECVD #1)

Historical Data

Thin-Film Properties

Uniformity Data

Low-Stress SiN - LS-SiN (PECVD#1)

SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

Historical Particulate Data

SiO2 deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

SiN deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

Standard Recipe


Historical Data

Thin-Film Properties
Uniformity Data

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

These Si3N4 recipes are not valid currently, and are still under development. 
-- Demis 2019-11-22

SiO2 deposition (Unaxis VLR)