Difference between revisions of "PECVD1 Recipes"
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(Created page with "=PECVD 1 (PlasmaTherm 790)= == SiN deposition (PECVD #1) == *SiN Standard Recipe *[[media:PECVD1 SIN Data-April 2014 SIN dat...") |
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== SiN deposition (PECVD #1) == |
== SiN deposition (PECVD #1) == |
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*[[media:PECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] |
*[[media:PECVD1-SiN-standard recipe 2014.pdf|SiN Standard Recipe]] |
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| − | *[[media:PECVD1 SIN Data-April 2014 SIN data.pdf|SiN Data (Deposition rate, Refractive index, Stress, HF etch rate)]] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN Data April 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN Data April 2014] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dElmTXZyOEZsOFdrMVhNLWpKXzVmNWc&usp=sharing SiN 1000A Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dElmTXZyOEZsOFdrMVhNLWpKXzVmNWc&usp=sharing SiN 1000A Thickness uniformity 2014] |
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Revision as of 18:48, 21 May 2014
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
- SiN Data April 2014
- SiN 1000A Thickness uniformity 2014
- Low Stress Si3N4 - Variable Stress Recipes
- Low Stress Si3N4 - Variable Stress Plot
SiO2 deposition (PECVD #1)
- SiO2 Standard Recipe
- SiO2 Data (Deposition rate, Refractive Index, Stress, HF etch rate)
- SiO2 Data April 2014
- SiO2 1000A Thickness uniformity 2014