Difference between revisions of "Other Dry Etching Recipes"

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{{recipes|Dry Etching}}
  
{{recipes|Dry Etching}}
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=[[XeF2 Etch (Xetch)]]=
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*[https://wiki.nanotech.ucsb.edu/w/images/2/25/06-XeF2-etch-recipe.pdf Si Etch Recipe]
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=[[Vapor HF Etch (uETCH)]]=
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*[https://wiki.nanotech.ucsb.edu/w/images/e/e2/25-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-a.pdf SiO<sub>2</sub> Etch Recipe 1]
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*[https://wiki.nanotech.ucsb.edu/w/images/d/d4/26-Dry_Etch_of_Unaxis_ICP-grown_SiO2_using_Vapor_HF_tool-b.pdf SiO<sub>2</sub> Etch Recipe 2]
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=[[CAIBE (Oxford Ion Mill)]]=
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*'''Reminder: From now on, one should always use P<sub>RF</sub>=200W! (see [[Bill Millerski|supervisor]] for explanation)'''
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*[https://wiki.nanotech.ucsb.edu/w/images/2/28/42-Etching_Platinum_using_Oxford_Ion_Mill_Tool-a.pdf Pt Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/e/e3/44-Etching_Gold_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Au Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/f/f1/45-Etching_Nickel_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Ni Etch Recipe]
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*[https://wiki.nanotech.ucsb.edu/w/images/5/53/InP_Etching_result-CAIBE.pdf InP Etch Recipe]
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=Misc=

Latest revision as of 08:17, 9 December 2022

Back to Dry Etching Recipes.

XeF2 Etch (Xetch)

Vapor HF Etch (uETCH)

CAIBE (Oxford Ion Mill)

Misc

Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Other_Dry_Etching_Recipes&oldid=160764"