Difference between revisions of "OLD - PECVD2 Recipes"
Jump to navigation
Jump to search
(→Photos) |
|||
| Line 18: | Line 18: | ||
*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]] |
*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]] |
||
| − | *[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data |
+ | *[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
||
| − | |||
| − | *Deposition Rate: ≈ 7.87 nm/min (users must calibrate this prior to critical deps) |
||
| − | *Refractive Index: ≈ 1.938 |
||
| − | *Stress ≈ 1.76MPa |
||
| − | *HF etch rate~47nm/min |
||
== Amorphous-Si deposition (PECVD #2) == |
== Amorphous-Si deposition (PECVD #2) == |
||