Difference between revisions of "ICP Etching Recipes"

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*[[media:07-GaN_Etch-Panasonic-ICP-1.pdf|GaN Etch Recipes Cl<sub>2</sub>N<sub>2</sub>]]
 
*[[media:07-GaN_Etch-Panasonic-ICP-1.pdf|GaN Etch Recipes Cl<sub>2</sub>N<sub>2</sub>]]
 
*[[media:Panasonic1-GaN-AlGaN-Selective-Etch-Plasma-RIE-ICP-RevA.pdf|GaN Selective Etch over AlGaN Recipes BCl<sub>3</sub>-SF<sub>6</sub>]]
 
*[[media:Panasonic1-GaN-AlGaN-Selective-Etch-Plasma-RIE-ICP-RevA.pdf|GaN Selective Etch over AlGaN Recipes BCl<sub>3</sub>-SF<sub>6</sub>]]
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==Sapphire Etch (Panasonic 1)==
 +
*[[media:Panasonic1-sapphire-etch-RIE-Plasma-BCl3-ICP-RevA.pdf|Sapphire Etch Recipes Ni and PR Mask - BCl<sub>3</sub>-Cl<sub>2</sub>]]
  
 
=[[ICP Etch 2 (Panasonic E640)]]=
 
=[[ICP Etch 2 (Panasonic E640)]]=

Revision as of 14:25, 24 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

SiNx Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

W-TiW Etch (Panasonic 1)

GaAs-AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

Sapphire Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs-AlGaAs Etch (Unaxis VLR)

InP-InGaAs-InAlAs Etch (Unaxis VLR)

GaN Etch (Unaxis VLR)