Difference between revisions of "Dry Etching Recipes"
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{{Recipe Table Explanation}} |
{{Recipe Table Explanation}} |
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+ | ! colspan="16" width="725" height="45" | <div style="font-size: 150%;">Dry Etching Recipes</div> |
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− | ! width="300" bgcolor="#D0E7FF" align="center" height="35 |
+ | ! colspan="4" width="300" bgcolor="#D0E7FF" align="center" height="35" | '''[[RIE Etching Recipes|RIE Etching]]''' |
− | ! width="300" bgcolor="#D0E7FF" align="center |
+ | ! colspan="4" width="300" bgcolor="#D0E7FF" align="center" | '''[[ICP Etching Recipes|ICP Etching]]''' |
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+ | ! colspan="4" bgcolor="#D0E7FF" align="center" |'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]''' |
− | ! bgcolor="#D0E7FF" align="center |
+ | ! colspan="3" bgcolor="#D0E7FF" align="center" |'''[[Other Dry Etching Recipes|Other Dry Etchers]]''' |
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! width="65" bgcolor="#D0E7FF" align="center" | '''Material''' |
! width="65" bgcolor="#D0E7FF" align="center" | '''Material''' |
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| width="85" bgcolor="#DAF1FF" | [[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]] |
| width="85" bgcolor="#DAF1FF" | [[Other_Dry_Etching_Recipes#Vapor_HF_Etch_.28uETCH.29|Vapor HF Etch<br>(uETCH)]] |
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| width="85" bgcolor="#DAF1FF" | [[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]] |
| width="85" bgcolor="#DAF1FF" | [[Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29|CAIBE<br>(Oxford)]] |
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− | | [[RIE Etching Recipes|A]] |
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|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}} |
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+ | | {{rl|ICP Etching Recipes|Ti Etch(Panasonic 1)}} |
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! bgcolor="#D0E7FF" align="center" | Mo |
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! bgcolor="#D0E7FF" align="center" | W-TiW |
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! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub> |
! bgcolor="#D0E7FF" align="center" | HfO<sub>2</sub> |
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! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub> |
! bgcolor="#D0E7FF" align="center" | SiO<sub>2</sub> |
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! bgcolor="#D0E7FF" align="center" | SiOxNy |
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! bgcolor="#D0E7FF" align="center" | TiO<sub>2</sub> |
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! bgcolor="#D0E7FF" align="center" | ZnO<sub>2</sub> |
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! bgcolor="#D0E7FF" align="center" | GaAs |
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! bgcolor="#D0E7FF" align="center" | InGaAlAs |
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! bgcolor="#D0E7FF" align="center" | InP |
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! bgcolor="#D0E7FF" align="center" | AlGaN |
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! bgcolor="#D0E7FF" align="center" | GaSb |
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! bgcolor="#D0E7FF" align="center" | CdZnTe |
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! bgcolor="#D0E7FF" align="center" | Si |
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! bgcolor="#D0E7FF" align="center" | Sapphire |
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Revision as of 13:52, 22 September 2017
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.
Dry Etching Recipes
| |||||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
RIE Etching | ICP Etching | Oxygen Plasma Systems | Other Dry Etchers | ||||||||||||
Material | RIE 1 (Retired) |
RIE 2 (MRC) |
RIE 3 (MRC) |
RIE 5 (PlasmaTherm) |
Si Deep RIE (PTI/Bosch) |
ICP Etch 1 (Panasonic 1) |
ICP Etch 2 (Panasonic 2) |
ICP-Etch (Unaxis VLR) |
Ashers (Technics PEII) |
Plasma Clean (Gasonics 2000) |
UV Ozone Reactor | Plasma Activation (EVG 810) |
XeF2 Etch (Xetch) |
Vapor HF Etch (uETCH) |
CAIBE (Oxford) |
Ag | |||||||||||||||
Al | A | R | R | ||||||||||||
Au | R | ||||||||||||||
Cr | A | R | A | ||||||||||||
Cu | |||||||||||||||
Ge | |||||||||||||||
Ni | R | ||||||||||||||
Pt | R | ||||||||||||||
Ti | R | A | |||||||||||||
Ru | |||||||||||||||
Mo | |||||||||||||||
Ta | |||||||||||||||
W-TiW | R | A | |||||||||||||
Al2O3 | |||||||||||||||
HfO2 | |||||||||||||||
ITO | R | ||||||||||||||
SiO2 | R | R | R | R | |||||||||||
SiN | R | R | R | ||||||||||||
SiOxNy | |||||||||||||||
Ta2O5 | |||||||||||||||
TiO2 | |||||||||||||||
TiN | |||||||||||||||
ZnO2 | |||||||||||||||
ZrO2 | |||||||||||||||
GaAs | R | R | R | R | |||||||||||
AlGaAs | R | R | R | ||||||||||||
InGaAlAs | R | R | |||||||||||||
InGaAsP | R | R | |||||||||||||
InP | R | R | |||||||||||||
GaN | R | R | R | ||||||||||||
AlGaN | R | ||||||||||||||
AlN | R | ||||||||||||||
GaSb | R | ||||||||||||||
CdZnTe | R | ||||||||||||||
ZnS | R | ||||||||||||||
ZnSe | R | ||||||||||||||
Si | R | R | |||||||||||||
SiC | R | A | |||||||||||||
Sapphire | R | A | |||||||||||||
Material | RIE 1 (Retired) |
RIE 2 (MRC) |
RIE 3 (MRC) |
RIE 5 (PlasmaTherm) |
Si Deep RIE (PlasmaTherm/Bosch Etch) |
ICP Etch 1 (Panasonic E626I) |
ICP Etch 2 (Panasonic E640) |
ICP-Etch (Unaxis VLR) |
Ashers (Technics PEII) |
Plasma Clean (Gasonics 2000) |
UV Ozone Reactor | Plasma Activation (EVG 810) |
XeF2 Etch (Xetch) |
Vapor HF Etch (uETCH) |
CAIBE (Oxford) |