Direct-Write Lithography Recipes

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Back to Lithography Recipes.

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Work In Progress

This article is still under construction. It may contain factual errors. Content is subject to change.


Photolithography Recipes for the Heidelberg MLA150 will go here.

Positive Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Developer Developer Time Comments
SPR955CM0.9 3 krpm/30” 95°C/60” ~ 0.9 um AZ300MIF

Negative Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Flood Developer Developer Time Comments
AZ5214 6 krpm/30” 95°C/60” ~ 1.0 um 60" AZ300MIF 60"
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