Direct-Write Lithography Recipes

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Revision as of 22:24, 13 September 2020 by John d (talk | contribs) (John d moved page MLA150 Recipes to Maskless Aligner Recipes without leaving a redirect: higher level category)
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Photolithography Recipes for the Heidelberg MLA150.

Positive Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Developer Developer Time Comments
SPR955CM0.9 3 krpm/30” 95°C/60” ~ 0.9 um AZ300MIF

Negative Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Flood Developer Developer Time Comments
AZ5214 6 krpm/30” 95°C/60” ~ 1.0 um 60" AZ300MIF 60"
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